以干涉微影製作之次波長微結構提升非晶矽太陽能電池的光學吸收率

黃子驊

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以干涉微影製作之次波長微結構提升非晶矽太陽能電池的光學吸收率

a-Si thin film optical absorption improve by subwavelength structures

黃子驊 , Masters　　Advisor：張正陽　　

繁體中文

非晶矽薄膜；次波長結構；光學吸收率；干涉微影；奈米壓印；光學模擬； Interference lithography ； Nano Imprint ； a-Si thin film ； subwavelength structure ； optical absorption ； RCWA simulation

Abstract │ Reference (22) │ Altmetrics

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Interference lithography is a good method which is large area of production, rapid, low-cost fabrication, and adjustable period, whether nano level etching mask in the production of solar cells, photonic crystals are widely used. In this study, we use interference lithography in the production period between 500nm to 1000nm found that the application of a-Si thin film on the expected increase in the absorption. The use of simulations and experiments is to discuss the effect of each layer in transmittance, Haze ratio and absorption. Then we discuss the accuracy of simulation and experiment. In the simulation, the a-Si thin film’s optical absorption is increase at the structure period of sub-1000nm.Structure film has the best optical absorption, optical absorption gain 20.5% at period 500nm. When it has back-reflection layer, period 300nm has the best absorption which is gain of 18.5 percent. In the ITO thickness is 70nm has the best anti-reflective effect.
   In this study, the production period is between 500nm to 1000nm in the structure of a-Si thin film was found that the absorption is increased in the part of long wavelength and short wavelength, especially in the structure period of 500nm, depth 130nm which absorption has gain 42.8% than those without structure. When it Coated a layer of silver as the reflective layer back after an a-Si film, the measurement of absorption is found that the absorption is increases of broad-band, and the absorption gain 41% at structure period 500nm.

Reference ( 22 ) 〈TOP〉

[1]. Dewan, R. and D. Knipp, Light trapping in thin-film silicon solar cells with integrated diffraction grating. Journal of Applied Physics, 2009. 106(7).
連結：
[2] Ferry, V.E., et al., Improved red-response in thin film a-Si:H solar cells with soft-imprinted plasmonic back reflectors. Applied Physics Letters, 2009. 95(18).
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[4] Isabella, O., et al., Modulated surface textures using zinc-oxide films for solar cells applications. Physica Status Solidi a-Applications and Materials Science, 2010. 207(3): p. 642-646.
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[5] Light scattering properties of surface textured substrates Phys. Status Solidi C 7, No. 3–4, 945– 948 (2010)
連結：
[6] Jager, K. and M. Zeman, A scattering model for surface-textured thin films. Applied Physics Letters, 2009. 95(17).
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