Optical thin film properties are related to the thin film's real microstructure, directly. Today, Many physical vapor deposition (PVD) techniques are used in optical thin film coating. In this paper we prepared Ta2O5 thin film by several important energetic PVD processes, evaporation, ion assisted deposition, magnetron reactive sputtering, and ion beam sputtering, respectively. The Ta2O5 surface morphology was studied using scanning electron microscopic (SEM) and surface particle size distribution were analyzed with image analysis system. In contrast to film growth are substantially influenced by the energy of arriving species at the B270 substrate glass. Especially the ion assisting species, the popular tools of increasing film package density, and controlled bombard the growing films during deposition.