歐傑電子顯微鏡與X光光電子能譜儀之表面分析特性

Surface Analysis Characterizations of Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy

沈奕伶(Yi-Ling Shen)

《真空科技》 27卷2期 (2014/06) Pp. 51-58

摘要

在科技發達的時代，表面分析之檢測技術愈顯得重要，本文主要以應用層面較廣及檢測分析項目上相似度接近的歐傑電子顯微鏡（AES）與X光光電子能譜儀（XPS）分析技術來說明。文中將分別介紹歐傑電子顯微鏡與X光光電子能譜儀之分析特性、儀器構造與分析上差異性：如表面分析解析度、影像觀測解析度、樣品導電性要求、以及能譜訊號解析的差異，並也針對二種分析技術搭配能譜範例之表面定性成份分析、成像分析、縱深分析及化學態鍵結判定之差異分別進行說明。於產業應用方面，以PCB板與電路板元件為參考範例，利用二種技術於表面定性分析能力進行差異性比較。無論選擇何種分析技術，期望能帶給讀者更深層的認識與了解。

關鍵字

歐傑電子顯微鏡 ； X光光電子能譜儀 ； 化學分析電子儀 ； 表面分析

並列摘要

In the age of advanced technology, the surface analysis techniques are more and more important. This paper will focus on wider applications and similar analytical items of Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). This paper will also respectively introduce the analytical characterizations of two techniques, instrument structures and analytical differences such as surface analysis resolution, image observation resolution, sample conductivity requirement, and spectrum differences. Moreover, using two kinds spectrum examples of surface analysis techniques illustrate the composition of qualitative analysis, image analysis, depth profile and identification the differences of chemical bonding. In industrial applications, PCB board and circuit board components can be the reference examples by using the two techniques to compare differences in the surface of qualitative analysis capabilities. No matter which kind of analysis can be expected to bring readers a deeper knowledge and understanding.

並列關鍵字

Auger Electron Spectroscopy ； AES ； X-ray Photoelectron Spectroscopy ； XPS ； Electron Spectroscopy for Chemical Analysis ； ESCA ； Surface Analysis