stands for Digital Object Identifier
and is the unique identifier for objects on the internet. It can be used to create persistent link and to cite articles.
Using DOI as a persistent link
To create a persistent link, add「http://dx.doi.org/」
before a DOI.
For instance, if the DOI of an article is 10.5297/ser.1201.002 , you can link persistently to the article by entering the following link in your browser: http://dx.doi.org/ 10.5297/ser.1201.002 。
The DOI link will always direct you to the most updated article page no matter how the publisher changes the document's position, avoiding errors when engaging in important research.
Cite a document with DOI
When citing references, you should also cite the DOI if the article has one. If your citation guideline does not include DOIs, you may cite the DOI link.
DOIs allow accurate citations, improve academic contents connections, and allow users to gain better experience across different platforms. Currently, there are more than 70 million DOIs registered for academic contents. If you want to understand more about DOI, please visit airiti DOI Registration （ doi.airiti.com ） 。
- 1.C. H. Ting and M. Paunovic, “Selective electroless metal deposition for via hole filling in VISI multilevel interconnection structures,” J. Electrochem. Soc. 136 (1989) .
- 2.H. Morinaga, M. Suyama, and T. Ohmi, “Mechanism of metallic particle growth and metal-induced pitting on Si wafer surface in wet chemical processing” J. Electrochem. Soc. 141 ,283 (1994) .
- 3.T. Homma, N. Kubo, T. Osaka, “Maskless and electroless fabrication of patterned metal nanostructures on silicon wafers by controlling local surface activities,” Electrochimica Acta 48, 3115 (2003).
- 4.N. Takano, N. Hosoda, T. Yamaka, and Tetsuya Osaka, “Effect of oxidized silicon surface on chemical deposition of nickel on n-type silicon wafer”, Electrochimica Acta 44, 3743 (1999).
- 5.吳志豪, “覆晶接合無電鍍鎳底層金屬成長之控制”, 碩士論文，國立成 功大學研究所.
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