射頻磁控濺鍍氧化鎳薄膜電性及光性之研究

Electrical and Optical Characterizations of NiO Thin Film Prepared by RF Magnetron Sputtering

盧陽明(Y. M. Lu) ； 楊哲勛(J. S. Yang) ； 黃文星(W. S. Hwang) ； 莊鑫堅(H. C. Chuang)

《材料科學與工程》 34卷2期 (2002/06) Pp. 79-84

https://doi.org/10.6409/JMSE.200206.0079

摘要

結晶的氧化鎳(NiO)薄膜因為具有極佳的化學穩定性、光學性質、電性及磁性,故可應用於各種不同的工業上。本研究利用射頻磁控濺鍍以不同的製程條件在康寧7059玻璃上沉積氧化鎳薄膜，觀察氧化鎳薄膜之微結構與性質之差異，以探討濺鍍方法成長氧化鎳薄膜時各濺鍍參數如：基板溫度、濺鍍時之氣體氛圍及濺鍍壓力對其微結構及薄膜性質所造成之影響。本研究以射頻磁控濺鍍法製備p-type之導電氧化鎳薄膜，所得到的氧化鎳薄膜最低電阻率為約0.206ohm-cm。本研究認為氧化鎳薄膜之電阻率與其薄膜內之氧原子含量有密切之關連，過量氧原子愈多，電阻率愈小。而氧化鎳薄膜之可見光穿透率亦受薄膜內之過量氧原子影響甚鉅，隨著過量氧原子之增加，引入愈多缺陷於薄膜內，可見光穿透率愈小。

關鍵字

氧化鎳 ； 透明導電薄膜 ； 電阻率 ； 濺鍍法

並列摘要

Thin films of nickel oxide with crystalline structure have a variety of applications due to their excellent chemical stability, as well as optical, electrical and magnetic properties, In this study, NiO thin films were deposited on Coring 7059 glass by RF magnetron sputtering with various sputtering parameters. The aim of this study is to find out how the deposition parameters such as substrate temperature, oxygen flow ratio, and sputtering pressure affect the microstructure and properties of the film. In this study, NiO film with low resisitivity (0.206 ohm-cm) was successfully deposited by RF magnetron sputtering. It is speculated that excess oxygen in NiO films have strong influences on the electrical and optical properties of the NiO films. Resisitiviy and transmittance of NiO films decreases with the increase of excess oxygen atoms in NiO films.

並列關鍵字

NiO ； Transparent conducting thin film ； Electrical resistivity ； Sputtering