透過您的圖書館登入
IP:18.222.162.216
  • 期刊

高溫材料熱膨脹特性之X-射線繞射測定

Study on The Behavior of Thermal Expansion of Al_2O_3, MgO and SiO_2 by X-Ray Diffraction

摘要


利用X-射線繞射法測定AI_2O_3,MgO及SiO_2在各溫度之晶型變化情形,並由此得知在各種溫度時之線膨脹係數,以作為高溫材料在成品製作之設計時或使用時之參考。實驗結果顯示MgO及AI_2O_3在高溫下有Schottky Defect產生。同時,AI_2O_3的熱膨脹具有異向性。本文並就「直接法」及「外差法」的不同加以討論;X-光射線之實驗數據以Fortran程序設計加以分析,精確可靠。

關鍵字

無資料

並列摘要


The coefficient of thermal expansion of AI_2O_3, MgO and SiO_2 are determined accurately at different temperatures by using an X-Ray diffractometer and a specially designed furnace. Equations are given for the variation of the lattice constants with temperature. The temperature dependence of the thermal expansion of MgO and AI_2O_3 at high temperature is shown to be related to the concentration of thermally generated Schottky defects. Besides, the thermal expansion coefficient of AI_2O_3 is shown to be anisotropic.

並列關鍵字

無資料

延伸閱讀