平面顯示器用高純度鋁濺鍍靶材開發

高純度鋁是平面顯示器中電極導線的主要材料，這些電極導線利用濺鍍製程在玻璃基板上形成薄膜，由於其純度要求高達99.999%以上，且濺鍍靶材的尺寸必須隨著玻璃基板的大小不斷提昇，目前已達一公尺見方以上。高純度材質代表顯微組織的控制不易，而大尺寸材料中顯微組織的均勻化對於材料的製造亦是一項極大的挑戰。本文即針對高純度鋁材，了解鍛軋應變量、加熱溫度，鍛軋溫度以及再結晶處理等製程參數對於顯微組織之影響，並確認最適合大型材料之熱機處理製程，獲得均勻細緻的顯微與集合組織，提高濺鍍效率，以符合平面顯示器業者的需求。本產品經過國內業者測試之後，陸續通過認證，已成為國內少數具備量產能力的平面顯示器用高級濺鍍靶材之一。

關鍵字

高純鋁；濺鍍靶材；平面顯示器；再結晶；熱機處理

並列摘要

High purity aluminum has been widely used as the conduction lines in flat panel display applications. These conduction lines are formed by thin film sputtering on glass substrates. The purity of such aluminum sputtering target is as high as 99.999%. Its dimensions are up to 1 m by 1 m in square and are still growing with the size of glass substrate. The high purity and large size requirements spell great challenges for its microstructural control. This article studies the effect of reduction ratio, hot working temperature, and recrystallization treatment upon the microstructures of high purity aluminum. The optimum thermo-mechanical processes were derived. The multiple textures developed are also beneficial for uniform sputtering rate. This newly developed aluminum sputtering target has been successfully qualified at local flat panel display makers and becomes the first of the few strategic materials that are localized for Taiwan's flat panel display industry.

並列關鍵字

High Purity Aluminum ； Sputtering Targets ； Recrystallization ； Flat Panel Display ； Thermo-mechanical Process

國際替代計量

平面顯示器用高純度鋁濺鍍靶材開發

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