氮化鋯鍍膜在氮氫混合氣氛退火後之劣化研究

Degradation of ZrN Films Annealed in Forming Gas

羅文政(W. Z. Lo) ； 詹佩諠(P. S. Chan) ； 呂福興(F. H. Lu)

《防蝕工程》 18卷4期 (2004/12) Pp. 415-422

https://doi.org/10.6376/JCCE.200412.0415

摘要

本研究主要探討以非平衡磁控濺射鍍著於(100)矽基材上之氮化鋯薄膜，在氮 氫混合氣(N2/H2=9)下退火後之劣化現象。退火溫度自300至1200℃，由X光繞射分析結果顯示，在700℃以上，會生成單斜晶系(monoclinic)的氧化鋯。另以掃描式電子顯微鏡觀察表面形貌，發現在400℃以上，會開始産生許多大小約5-10μm之圖形凸狀物變得更緻密。在低溫形成的凸狀物是由於退火時應力鬆弛所至，至於高溫生成緻密不規則凸狀物的原因，主要由於氧化的關係。

關鍵字

氮化鋯 ； 退火 ； 劣化 ； 應力

並列摘要

The objective of this research is to investigate the degradation of ZrN film annealed in forming gas (N2/H2=9). The films were deposited onto (100) Si substrate by unbalanced magnetron sputtering. Annealing was conducted in the temperature range of 300-1200℃. X-ray diffraction results showed that monoclinic Zr02 appeared above 700℃. Changes in the morphology of the films were examined by a scanning electron microscope. Large blisters with the size of 5~10μm appeared above 400℃. Some blisters have a broken surface. Many small irregular blisters showed up above 800°C. The formation of those large blisters was due to stress relaxation. As for the small blisters, they were essentially resulted from oxidation.

並列關鍵字

ZrN ； Annealing ； Degradation ； Stress