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氮化鎵系列發光二極體以輕摻雜氮化鎵層改善光特性和抗靜電能力

Improved Optical and Electrostatic Discharge Characteristics for GaN-Based LEDs with an n(superscript -)-GaN Layer

摘要


氮化鎵系列發光二極體使用輕摻雜氮化鎵層結構已經被提出且成功製造。藉著嵌入輕摻雜氮化鎵層,可提供較大的垂直方向串聯電阻,進而增強電流散佈能力,使光強度提升。除此之外,我們也發現,當輕摻雜氮化鎵層厚度為0.15,0.2和0.25μm時,抗靜電能力分別可以承受至-1200,-1800和-3000V。

並列摘要


Nitride-based light-emitting diodes (LEDs) with an n(superscript -)-GaN layer were proposed and fabricated. By providing a larger series resistance in the vertical direction, it was found that the n(superscript -)-GaN layer could enhance LED output intensity due to the enhanced current spreading. It was also found that LEDs with an n(superscript -)-GaN layer thickness of 0.15, 0.2 and 0.25 μm could endure electrostatic discharge (ESD) surges up to -1200, -1800 and -3000 V, respectively.

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