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鋁摻雜氧化鋅奈米粒子光電特性之研究

Optical and Electrical Properties of Al-doped ZnO Nanoparticles

摘要


本研究利用溶膠 - 凝膠法製作氧化鋅(ZnO)奈米粒子,探討摻雜不同濃度的鋁(Al)對ZnO 奈米粒子特性的影響;並利用ZnO奈米粒子製作光檢測器,探討元件光響應特性。經由掃描式電子顯微鏡、X光繞射分析、光致螢光光譜以及拉曼光譜量測得知奈米粒子的材料特性。實驗結果顯示,將Al摻入ZnO後,因Al與Zn離子半徑不同影響原子排列結構導致結晶性變差,進而增加多聲子散射致使非輻射復合機率增加。此外,觀測有無摻Al的ZnO所製作之光檢測器,結果顯示摻Al的元件電流值較未摻 Al的元件大,其原因為 Al3+ 取代 Zn2+會多出一個自由電子,使得載子濃度增加以及電阻率下降。然而,當Al摻雜濃度高於5%時,多聲子散射現象增加而使得電阻率再度上升。另外,關於元件光響應的反應速度探討得知,因摻雜Al的ZnO具有較多陷捕中心,因此摻Al的元件反應時間常數較未摻Al的元件大。

並列摘要


This study investigates the effect of Al content on the optical, electrical and structural properties of the sol-gel Al-doped ZnO nanoparticles by x-ray diffraction, scanning electron microscopy, photoluminescence and Raman scattering measurements. When more Al are substituted into the ZnO system the difference in ionic radii of Zn2+ and Al3+ starts playing an increasingly important role causing the presence of the multiple phonons scattering stress in the Al-doped ZnO nanoparticles. It is shown that the multiple phonons scattering may lead to an increase in the probability of nonradiative recombination. The dark current and photocurrent of the Al-doped ZnO device are larger than those of the ZnO device, due to a combined effect of the increased substitutional-Al (AlZn) density and the increased carrier concentration. However above 5% Al doping, resistivity again increases with the increase in the multiple phonons scattering processes. The photoresponse studies show that the time constants of the Al-doped ZnO device are larger than those of the ZnO device. This is because of the higher trap density of the Al-doped ZnO device than the ZnO device.

被引用紀錄


蔡尚廷(2014)。球形金奈米粒子的兩色現象研究〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://doi.org/10.6841/NTUT.2014.00648
許家銘(2012)。N型與P型氧化鋅之研製〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://doi.org/10.6827/NFU.2012.00089
蕭瑋華(2016)。利用射頻磁控共濺鍍系統沉積金屬摻雜氧化鋅薄膜之研究〔碩士論文,國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-0908201614443200

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