以磁濾式陰極真空電弧技術沉積高導電度與耐腐蝕性薄膜之研究

Study on High Conductivity and Corrosion Resistance of the Thin Films Deposited by FCVA

陳肇英(Chao-Ying Chen) ； 吳金寶(Jim-Bao Wu) ； 施進德 ； 張嘉珍

《真空科技》 27卷1期 (2014/03) Pp. 43-47

摘要

本研究乃是利用磁濾式陰極真空電弧（Filter Cathodic Vacuum Arc，簡稱FCVA）電漿離子鍍膜技術沉積具有高導電度與耐腐蝕性的氮化鈦（TiN）薄膜，研究鍍膜參數對於薄膜之電性與不同基材之耐腐蝕蝕特性之影響，並了解透過FCVA高能電漿離子鍍製的膜層與基材之附著性。電性與腐蝕分析結果顯示，TiN薄膜之導電度可達2.948×10^4 S/cm，腐蝕電流密度值為4.32×10^(-8) A/cm^2；利用刮痕試驗得知TiN薄膜與基材之附著力可達69.27N。

關鍵字

陰極真空電弧 ； 氮化鈦 ； 保護膜層

並列摘要

In this study, we use of Filter Cathodic Vacuum Arc (FCVA) plasma ion plating technique to prepare titanium nitride (TiN) thin films with high conductivity and corrosion resistance. Research in the influence of the parameters on the electrical properties and corrosion characteristics of the films on different substrates, and learn the adhesion between substrate and the thin films coated by high energetic plasma ion of FCVA. Electrical and corrosion analysis showed, conductivity of the TiN film is up to 1.835 × 10^4 S/cm, and the density of corrosion current is 4.32×10^(-8) A/cm^2. On the other side, we do scratch test to know that the adhesion between TiN film and substrate could be up to 69.27 N.

並列關鍵字

Cathodic Vacuum Arc ； Titanium Nitride ； Protective films