以PECVD鍍膜技術製備疏水薄膜應用於光學鏡片

Preparation of Hydrophobic Thin Film by PECVD Technology for Optical Lens

彭武章(Wu-Chang Peng) ； 林正偉(Cheng-Wei Lin) ； 何主亮(Ju-Liang He) ； 歐信良(Sin-Liang Ou) ； 田春林(Chuen-Lin Tien) ； 劉楷哲(Kai-Che Liu)

《真空科技》 32卷3期 (2019/09) Pp. 20~1-20~5

摘要

本研究利用低成本有機矽氧烷類－六甲基二矽氧烷（Hexamethyldisiloxane, HMDSO）原料，並以電漿聚合技術（Plasma polymerization）與電漿輔助化學氣相沉積（PECVD）法藉由調控HMDSO流量，使其鍍膜成長出奈米形貌之疏水薄膜。實驗結果的穿透率92.7%，並由分別由SEM與FTIR分析顯示，沉積所得鍍膜的表面是隨機分散二氧化矽奈米顆粒，為具有疏水性之SiO_2鍵結，調整HMDSO流量所得鍍層水滴接觸角（Contact angle）量測結果為105.4°，此薄膜表現具有疏水性，主要歸因於奈米結構的表面形態即HMDSO經電漿裂解後所得到之SiO_2顆粒，顯示此疏水薄膜可應用於光學鏡片。

關鍵字

薄膜 ； 疏水性 ； 電漿聚合 ； 電漿輔助化學氣相沉積 ； 水滴接觸角

並列摘要

In this study, a low-cost organic phthalocyanine-Hexamethyldisiloxane (HMDSO) raw material was introduced into the plasma polymerization technology and PECVD method to regulate the flow of HMDSO. It develops a hydrophobic thin film with a nanotopography. The experimental result of transmittance is 92.7%. The surface of the deposited coating is randomly dispersed cerium oxide nanoparticle, which is a hydrophobic SiO_2 bond by the SEM and FTIR analyzed. The measured result of the highest water droplet contact angle of the coating obtained by adjusting the HMDSO flow rate is 105.4°, and the film has hydrophobicity, which is mainly attributed to SiO_2 nanoparticles formed by the breaking of bonds molecules from the surface morphology of the nanostructure HMDSO during plasma bombardment. The experimental results show that the hydrophobic thin film can be applied to optical lenses.

並列關鍵字

Thin film ； Hydrophobic ； Plasma-polymerization ； PECVD ； Contact angle