我們利用電漿輔助化學氣相沉積法在聚碳酸酯塑膠基材上沉積之薄膜阻氣層:氮化矽(50 nm)/化矽(50nm),經使用MOCON儀器得知量測之阻氣膜可將水氣透過率降至0.01 g/平方公尺/day以下,氧氣透過率降至約0.1 g/平方公尺/day。為了進一步降低水、氧氣透過率,在此我們加入聚-對二甲苯有機層作為平坦化與缺陷錯開層,藉由鈣測試法得知,在25℃、相對溼度40%時,雙層之聚-對二甲苯/氮化矽薄膜在塑膠基材上的水氣透過率可降至約2×10^(-4) g/平方公尺/day。在最佳的條件下,重複堆疊4對之聚-對二甲苯/氮化矽多層鍍膜,經鈣測試法計算後,可將水氣透過率降至7.41×10^(-6) g/平方公尺/day。
Under optimization of plasma-enhanced chemical vapor deposition conditions, the barrier coatings (silicon nitrite, SiN(subscript x) 50 nm/silicon oxide, SiO(subscript x) 50 nm) on polycarbonate (PC) substrates at 200 ℃ could reduce the water vapor transmission rate (WVTR) to 0.01 g/m^2/day and oxygen transmission rate (OTR) to 0.1 g/m^2/day, respectively (via the Mocon instruments). To further reduce the permeation rate, the organic film (parylene C) was introduced in the barrier coating structure as the smooth and defect-decoupled layer. From the calcium test, the WVTR of parylene/SiN(subscript x) bilayer on the PC substrate can decrease to 2×10^(-4) g/m^2/day under room temperature and 40% relative humidity environment. Finally, the four-pair parylene/SiN(subscript x) structure can achieve a WVTR value of 7.41×10^(-6) g/m^2/day.