以六甲基二矽氧烷與氧氣輝光放電製備之SiOxCyHz薄膜阻水阻氧特性研究

本研究利用電漿輔助化學氣相沉積以有機六甲基二矽氧烷(HMDSO)和氧氣做為前驅氣體來製備薄膜，進行薄膜阻水阻氧特性的研究。本封裝膜是由有機和無機成分混成，由無機成分提供主要的阻水功能，有機成分擔任應力釋放與缺陷填補的角色。實驗中透過選取適當製程功率(60W)以及理想的氧氣與六甲基二矽氧烷流量之比例(O2/HMDSO=15)製備厚度1.5μm之混成封裝膜，其水氣穿透率3.6×10-6g/m2-day，氧氣穿透率1.12×10-3cc/m2-day，在玻璃上可見光穿透率90%，已達到有機太陽能電池的封裝標準。實驗成功的利用有機無機混合的特性取代多層膜的繁複，實現單一製程、低成本、高透光與高阻水性的薄膜，未來對於軟性電子的封裝，有極大的應用價值。此外，藉由混成膜折射係數的調變，可以產生降低反射及提升可見光穿透率的效果。

關鍵字

六甲基二矽氧烷

並列摘要

This research studies the permeation barrier properties of thin films deposited from a gas mixture of hexamethyldisiloxane (HMDSO) and oxygen by plasma-enhanced chemical vapor deposition (PECVD) at room temperature. The thin-film is comprised of organic and inorganic compounds. The inorganic compounds can serve as permeation barrier while organic compounds offer mechanical flexibility and reduce defect. With process power(60w) and O2 to HMDSO flow rate ratio(O2/HMDSO=15), a water vapor transmission rate of 3.6×10-6 g/m2-day and an optical transparency higher than 90% in the visible light region can be obtained in a 1.5μm thin film. The result reaches the encapsulation standard for organic solar cells, which has shown a great application potential for flexible large-area manufacturing of thin-film encapsulation at relatively low-cost. The optical reflection can be reduced by properly adjusting the reflective index of the hybrid film.

並列關鍵字

Hmdso

參考文獻

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以六甲基二矽氧烷與氧氣輝光放電製備之SiOxCyHz薄膜阻水阻氧特性研究

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