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製作電致發光圖案織物之研究

The Study of Making Electroluminescence of Pattern Fabric

摘要


本研究是以一般織物為基材取代ITO 軟板,先以網版刷方式在導電基底製圖,再利用精密塗佈製程(comma bar)依序於布上塗佈介電樹脂層(BT2100)、螢光層(GG24+ITK5517)以及透明導電層(導電高分子),透過精密刮刀塗佈可控制各塗層之厚度以達到較佳之均勻度。本實驗之目的是以網版塗佈方式在銀膠製作圖案,並改變發光層之狹縫高度,觀察其厚度在通入外加交流電源(75、150、300VAC)對其發光亮度之影響。其中導電基底狹縫高度為40μm,介電樹脂狹縫高度為50μm,螢光層之狹縫高度分別為70、80、90μm,導電層則為20μm。由實驗結果得知,在螢光層狹縫高度為80μm 時並通入交流電壓150V 及300V,電致發光織物有最佳的發光亮度其發光亮度分別為83.7lux、121.3 lux。

並列摘要


This study is replace ITO by general fabric to substrate, first, use screen print method to make pattern on silver colloid, and then use of precision process (commar bar) coating resin on fabric in order of conductive substrate(silver colloid), BT2100, phosphor layer (GG24+ ITK5517), and transparent conductive layer(conductive polymer). By blade coating can be controlled through the precise thickness of the coating in order to achieve better the uniformity. The purpose of this experiment is use screen print method to make pattern on silver colloid, and then change the phosphor layer of the coating thickness, and to observe the impact of thickness to brightness when leads in external AC power (75, 150, 300VAC), silver colloid coating thickness of 40μm, dielectric resin coating thickness of 50μm, phosphor layer coating thickness of 70, 80, 90μm, conductive layer coating thickness of 20μm. In experimental results, phosphor layer coating thickness of 80μm, and leads in external AC power 150V and 300V, the electro luminescent fabric will have the best brightness 83.7 lux, 121.3 lux.

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