- 期刊
Structural and Electrical Characteristics of Metal-Ferroelectric Pb_(1.1)(Zr_(0.40)Ti_(0.60))O_3-Insulator (ZnO)-Silicon Capacitors for Nonvolatile Applications
延伸閱讀
- Lee, J. H. (2011). Current Conduction Mechanisms in an Advanced Metal-Insulator-Metal Capacitor with Nickel Fully Silicided Polycrystalline Silicon Electrodes. 清雲學報, 31(4), 31-42. https://doi.org/10.7049/JCYU.201110.0031
- 簡銘萱（2007）。Electrical properties of Al2O3-HfO2 dielectric capacitors using atomic layer deposition in metal-insulator-metal configuration〔碩士論文，國立清華大學〕。華藝線上圖書館。https://doi.org/10.6843/NTHU.2007.00207
- Wang, S. G. (2013). Fabrication and Characteristics of Ion-implanted 4H Silicon Carbide Metal-Semiconductor Field-Effect Transistors on a P-Type Epilayer. Chinese Journal of Physics, 51(2), 337-346. https://doi.org/10.6122/CJP.51.337
- 林志銘（2008）。The Study of Metal (Al)/ Ferroelectric (BiFeO3)/ Insulator (Y2O3)/ Silicon (p-type) MFIS Capacitors and Field Effect Transistors for Nonvolatile Memory Applications〔碩士論文，國立清華大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0016-2002201315031360
- 江政達（2006）。The Fabrication and Electrical Properties of Metal(Al)/Ferroelectric(Pb(Zr0.6Ti0.4)O3)/Insulator(HfO2 and ZrO2)/Silicon (p-type) MFIS Capacitors and Field Effect Transistors〔碩士論文，國立清華大學〕。華藝線上圖書館。https://doi.org/10.6843/NTHU.2006.00211