陰極電弧沈積氮化鋁鈦／氮化鉻奈米多層薄膜之開發與應用

Synthesis and Application of TiAlN/CrN Multilayered Coatings by a Cathodic Arc Deposition Process

汪大永(Da-Yung Wang) ； 張銀祐(Yin-Yu Chang) ； 洪志穎(Chi-Yung Hung)

《科學與工程技術期刊》 1卷2期 (2005/09) Pp. 1-6

https://doi.org/10.7117/JSET.200509.0001

摘要

物理氣相沉積技術所製備之硬質薄膜在近十年來已經快速發展成為國內表面工程之主流，商業化產品如氮化鈦(TiN)、氮化鉻(CrN)及氮化鋁鈦(TiAlN)硬質薄膜已廣泛使用於機械加工業、半導體製程設備組件與汽車零件產業。奈米複合多層硬質鍍膜比起傳統硬質鍍膜由於具備良好之耐磨耗與高溫化學穩定性，成為近年來學術研究與工業應用之熱門領域。在各種真空離子鍍膜技術中，陰極電弧沈積(cathodic arc evaporation, CAE)技術具有高離化率、沈積速度快、可使用合金靶材等優點，近年來國內在此技術上已開發出相關系統硬體與商業化鍍膜技術。本文中將介紹由本研究群開發之陰極電弧沈積系統製備具有奈米多層結構之氮化鋁鈦／氮化鉻(TiAlN/CrN)薄膜，探討其微結構、機械性質與工業應用。

關鍵字

硬質鍍膜 ； 物理氣相沉積 ； 陰極電弧沈積

並列摘要

Nanostructured coatings have attracted considerable attention as wear-protective coatings due to their outstanding properties relative to single-phase materials. Their increased hardness makes them interesting candidate materials for applications under extreme conditions. In addition to high hardness and low friction coefficients, other aspects such as thermal stability, coating toughness, and interface toughness are decisive parameters of protective coatings. The design of nanostructured coatings mainly depends on the interface volume, crystallite size, single layer thickness, epitaxial stress and strain, etc., all of which depend significantly on materials selection, deposition techniques and process parameters. We have developed a deposition system and coating synthesis techniques in recnet years. In this study, coating design methodology and synthesis of TiAlN/CrN multilayered coatings are described with emphasis on the cathodic arc evaporation deposition technique.

並列關鍵字

hard coating ； physical vapor deposition ； cathodic arc evaporation