本實驗使用陰極電弧蒸鍍系統沉積AlCrSiN/TiVN多層薄膜,使用純鈦靶、鋁鉻矽靶以及鈦釩靶,並以TiN做為介層增加薄膜附著力,再利用鋁鉻矽靶以及鈦釩靶材的相對位置設計多層薄膜結構,最後改變轉架速度(1rpm、2rpm、4rpm)探討其週期厚度對機械性質與切削性能之研究。 薄膜機械性質研究部分,主要用本研究室洛式壓痕試驗儀對薄膜測試基本的附著力。利用本實驗室之微小硬度儀,針對單層薄膜與多層薄膜之硬度比較。利用衝擊試驗機進行常溫與高溫疲勞測試,再配合場發式電子顯微鏡以及能量散射光譜儀觀察薄膜破損狀況以及基材分佈訊號,使用Pin-on-disc磨耗試驗測試高溫以及常溫之薄膜摩擦係數,再搭配表面輪廓儀計算薄膜之抗磨損性能。最後進行刀具切削實驗,刀具針對Ti-6Al-4V鈦合金進行切削速度80m/min以及200m/min比較其切削性能。 實驗結果AlCrSiN/TiVN-4週期厚度9.53nm,AlCrSiN厚度為4.03nm,TiVN厚度為5.5nm,具有高硬度40.67GPa、抗衝擊性能,尤其在高溫500℃磨耗與高溫氧化700℃後之磨耗AlCrSiN/TiVN-4表現出最低摩擦係數0.662以及0.621,且具有較低的磨損係數。在實體高速切削200m/min實驗中,AlCrSiN/TiVN-4表現出低磨耗量。驗證了多層薄膜AlCrSiN/TiVN交疊的設計有效抑制差排行為產生,相較於單層AlCrSiN、TiVN提高了硬度、抗塑性變形,AlCrSiN/TiVN透過多層的交錯有效提升TiVN薄膜抗氧化行為,且降低了AlCrSiN薄膜之摩擦係數。
The experiment using cathodic arc evaporation deposition system AlCrSiN/TiVN multilayer film, the use of Ti target, AlCrSi target, and TiV target. Using TiN film as a interlayer increases the adhesion, re-use AlCrSi target and TiV target target the relative position of timber design multilayer film structure, and finally change the turret speed (1rpm, 2rpm, 4rpm) of its thickness period on the mechanical properties and oxidation behavior . For the mechanical properties of the film section, use this lab tester for Rockwell indentation test basic film adhesion. Use of micro hardness tester, a comparison of the hardness of monolayer films and multilayer films. The use of impact testing machine at room temperature and high temperature fatigue test, coupled with SEM to observe the film break. Use Pin-on-disc wear test the film coefficient of friction at room temperature and high temperature. The results AlCrSiN/TiVN-4 multilayer with the period of 9.53nm, AlCrSiN thickness of 4.03nm, TiVN thickness of 5.5nm, increase hardness, impact resistance. Its high-temperature 500℃ and high temperature oxidation 700℃ of AlCrSiN/TiVN-4 exhibits the lowest coefficient of friction of 0.662 and 0.621, and have lower wear coefficient. In the real high-speed cutting 200m/min experiments, AlCrSiN/TiVN-4 showed a low amount of wear. Verify that the multilayer film AlCrSiN/TiVN overlap are designed to effectively suppress ranked as poor, and to improve the hardness, resistance to plastic deformation; TiVN film to enhance the oxidation behavior and reduce the friction coefficient AlCrSiN thin film.