輻射熱追蹤應用於快速熱處理之探討

Thermal Radiation in a Horizontal Rapid Thermal Processor Using Ray Tracing

翁宗賢(Tzong-Shyan Wung) ； 陳富義(Fu-Yi Chen)

《國立金門技術學院學報》 1期 (2005/03) Pp. 11-22

https://doi.org/10.7057/JNKIT.200503.0011

摘要

在半導體快速熱處理製程中，最主要的熱傳機制是由熱輻射所主控。本文利用光線追蹤的方法，探討在水平式八吋晶圓快速熱處理爐中，由加熱鹵素燈管經由石英窗照射至晶圓熱輻射的分佈；並在晶圓邊緣放置一組鍍金平面反射鏡，藉由調整反射鏡的角度與距離來補償晶圓邊緣的輻射熱損失。由數值模擬結果顯示，將反射鏡置於適當位置可將入射至晶圓表面的輻射量不均勻度降低至5.6%。若將平面反射鏡改成三面斜角放置的反射鏡，則可將不均勻度再降低至4.9%。

關鍵字

快速熱處理 ； 光線追蹤 ； 熱輻射 ； 熱通量 ； 反射鏡

並列摘要

Thermal radiation dominates heat transfer in rapid thermal processing of semiconductor manufacturing. This paper utilizes ray tracing to investigate incident thermal radiation of an 8 in. wafer in a horizontal rapid thermal processor. Rays arrived at the wafer can be those emanated from halogen lamps and direct transmitted though a quartz window, or those reflected by reflectors and walls in addition to window transmission. Thermal energy will differ with various routes and reflections. To compensate deficient incident radiant around edge of the wafer, a pair of flat mirrors is positioned beside the wafer to bring side-wall radiation to the edge which can effectively reduce nonuniformity to 5.6%. When the flat mirror is replaced by three pieces mirrors with proper orientations for each side, the nonuniformity can further reduce to 4.9%.

並列關鍵字

Rapid thermal processing ； ray tracing ； thermal radiation ； heat flux ； reflector