Structure and Reactions at Electrochemical Interfaces as Probed by in Situ Microscopic and Spectroscopic Techniques

以臨場顯微及光譜技術觀察電化學界面之結構及反應

黃炳照(Bing-Joe Hwang) ； 夏瑪(Loka Subramanyam Sarma)

《界面科學會誌》 27卷3&4期 (2005/09) Pp. 217-238

https://doi.org/10.30020/JCCIS.200509.0005

摘要

在過去的二十年裡，新型光譜技術已經被廣泛地應用於研究分子級之界面現象。在此篇論文中將闡述本實驗室有關電化學界面中之物質結構變化及反應現象之近期發展。在近幾年於此方面之研究成果中，本實驗室已建立了同步光譜技術諸如XRD、XAS、SERS、AFM、以及EQCM等，而其應用則涵蓋了不同領域，例如在金屬電極上之導電高分子之電化學成長機制、金屬顆粒表面之單層金屬原子、電池材料之結構轉變等方面皆已在此做一深入且廣泛之探討。

關鍵字

結構 ； 反應 ； 電化學界面 ； 臨場光譜技術

並列摘要

In the last two decades, new spectroscopic techniques have been developed and applied to study the interfacial phenomena at molecular level. This feature article presents the recent progress achieved mainly in our laboratory on the structural changes and reactions at electrochemical interfaces. In situ spectroscopic techniques such as synchrotron based X-ray diffraction (XRD) and X-ray absorption spectroscopy (XAS), surface-enhanced Raman spectroscopy (SERS), microscopic technique like atomic force microscopy (AFM) and electrochemical quartz-crystal microbalance (EQCM) have been successfully developed in recent years in our laboratory. Applications are exemplified on various areas such as electroformation of polymers on metal electrodes, transformation of metal monolayers on metal clusters, and batteries, and several advantages of in situ spectroscopic techniques are demonstrated.

並列關鍵字

structure ； reaction ； electrochemical interface ； in-situ spectroscopic techniques