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  • 學位論文

大行程晶圓檢測平臺之控制及軌跡精度研究

Control and Trajectory Accuracy Research for a Large Stroke Wafer Inspection Stage

指導教授 : 顏家鈺

摘要


晶圓檢測平臺是一個具有高精度,高速度,高加速度等特點的多軸運動系統,本平臺使用了雙線性馬達驅動和氣浮導軌支撐導向,以及光學尺作為主要的位置量測系統。平臺運動性能會受到馬達的機電特性、氣浮導軌的機械特性、負載變化等影響,本文以提高精密氣浮運動平臺的單軸定位精度為目標,通過模擬、實驗的方法設計精密氣浮運動平臺的控制器,同時對雙軸運動的軌跡精度進行初步的研究,主要研究內容如下: 首先,本文基於永磁同步線性馬達的工作原理,建立了永磁同步線性馬達的數學模型,然後對雙線性馬達驅動的晶圓檢測平臺動力學模型進行了分析,考慮到Y-plate在大行程運動條件下會造成X軸馬達驅動質心的顯著變化並引起雙馬達驅動力的變化,本文亦對此進行了分析討論,研究了系統質心對於系統動態模型特性的改變,並完成了對各軸馬達系統的系統識別。 其次,控制器的設計方面,為了讓系統辨識之結果與實際受控場的誤差不影響到最後定位精準度,提高系統的強韌性,本論文將先介紹由Tsai[1]所提出的CSD方法來設計H∞控制器,並根據此套方法來設計基於Sensitivity Shaping的強韌控制器。 最後,通過模擬和實驗優化控制器參數,分別進行並討論了單軸定位控制實驗、XY軸二維軌跡的跟蹤精度實驗以及結果,另外還測試了平臺的最大速度等動態性能。

並列摘要


The wafer inspection stage is a multi-axis motion system with high precision, high speed, and high acceleration, etc. The stage uses dual linear motors to drive and air-bearing rail to support and an optical ruler measuring position. Because the perfor-mance of the motor is influenced by the mechanical and electrical characteristics of the motors, mechanical characteristics of the air-bearing rail, and changes of the load and its position, this article aims to improve the accuracy of the single axis positioning and the accuracy of the two-dimensional trajectory through simulation and experimentation. The main research contents are as follows: First, based on the working principle of the permanent magnet synchronous linear motor, the mathematical model of the motor is established. Then the dynamic model of the wafer inspection stage driven by dual linear motors is analyzed. Considering that the Y-plate has a large stroke motion, and it will cause changes in the X-axis motor drive center of gravity and cause changes in the dual-motor drive force, so this article also an-alyzed and discussed this and studied the influence of system’s center of mass’s change on the system dynamic model and completed each axis’s system identification. Secondly, in order to make the error between system identification result and the real motor dynamic not affect the final positioning accuracy and improve the system's robustness, this paper will introduce the CSD method proposed by Tsai[1] ,and then de-sign a H∞ controller based on Sensitivity Shaping through this method. Finally, we conducted and discussed the X-axis and Y-axis uniaxial positioning control experiments, the XY-axis two-dimensional tracking accuracy control experiment, including the wafer inspection movement experiment.

參考文獻


[1] D.-W. G. M.-C. Tsai, D.-W. Gu, and D. A-Wei, Robust and Optimal Control, A Two-port Framework Approach, vol. 38, 2014.
[2] Erik R Loopstra, Heeze, ASML. Two dimensionally balanced positioning device with two object holders and lithographic device provided with such a positioning device. United States Patent US 5969441, 1999-10-19
[3] Erik R Loopstra, Philips electronics. Positioning device having two object holders. United States Patent US 6262796, 2001-07-17
[4] Kwan Yim Bun Patrick, ASML. Positioning system for use in lithographic appa-ratus. United States Patent US 6635887, 2003-10-21
[5] http://search.newport.com/?i=1&q=*&x2=sku&q2=DYNAMYX%20GT

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