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  • 學位論文

光波前拼接式量測系統之設計與開發

Design and Development of Stitching Wavefront Measurement System

指導教授 : 黃光裕

摘要


隨著元件加工尺寸日益縮小,精密量測需求也日益重要,擁有非接觸性與高解析度的光學量測必然是精密量測發展重點之一。在光學量測系統中各光學元件的品質好壞也直接影響量測系統的性能,因此光學元件之量測系統是研發精密光學量測系統重要的一環,如透射式光學元件常以出射光與入射光的相位差作為品質好壞的依據。Shack-Hartmann光波前感測器與干涉儀同樣是量測光的相位差,以相位差得到光路中的反射或透射物的表面輪廓或特性,然而Shack-Hartmann光波前感測器不同於干涉儀,有較易於架設與較強的環境干擾的特性。 本論文設計開發出光波前拼接式量測系統,分析因拼接所造成的光波前輪廓誤差,以輪廓誤差特性訂定修正項次,運用拼接誤差修正運算法估算誤差得修正量。藉由光學軟體進行實驗光路設計與分析,並使用模擬數據探討拼接誤差修正運算法之適用範圍與特性,透過實驗結果驗證誤差修正運算法能夠大幅降低拼接所造成的光波前輪廓誤差,並增加系統的量測結果穩定度,將拼接誤差PV值控制至0.8λ以下,以及RMS值至0.2λ以下,開發之系統解析度PV值為0.061λ,以及解析度RMS值為0.004λ,所開發機台最大可拼接量測範圍為直徑6.73 mm。

並列摘要


Nowadays, the sizes of the mechanical components have been scaling down, the requirement of precise measurement is higher increasingly. Optical measurements with the advantages of non-contact and high resolution is one of the main developing technologies in precision measurements. The performance of optical measurement system is influenced by the quality of the optical component. Therefore, the measurement system for optical component plays an important part in the field of researching and development of precision optical measurement. The quality of transmissive optical components is usually judged by the phase difference between the incident beam and exit beam. Shack-Hartmann wavefront sensor (SHWS) and interferometer is able to measure the phase difference of light beam and capture the surface contour or feature of reflective or transmissive component. Howerever, SHWS with the advantages of simple set-up and anti - environmental interference is different from interferometer. A wavefront measurement system based on stitching method is designed and developed in this paper. By analyzing the error contour of wavefront caused by stitching, the correction polynomial is determined and the stitching error correction algorithm is able to estimate correction quantity. The optical set-up is designed and analyzed by optical simulation software, Zemax, which is used to generate simulation data to study the effective range and feature of stitching error correction algorithm. The experiment shows that stitching error correction algorithm is able to reduce the error caused by stitching and improve stability of system. Finally, the P-V error of wavefront can be reduced to 0.8 λ, and the RMS error of wavefront is under 0.2 λ. Resolution reaches 0.061λin P-V error and 0.004 λ in RMS error. The maximum measurement range of stitching diameter reaches 6.73 mm.

參考文獻


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