- 學位論文
可撓性奈米碳管平面顯示器之研究
A Study of Flexible Carbon-Nanotube Flat Panel Display
摘要
本文主要是研究可撓性奈米碳管平面顯示器。內容包含顯示器之陰陽極板之製作方式，同時也提出簡單的封裝形式。為順利完成本文之相關實驗，除了運用現有設備外，亦研製開發了一些必要性之實驗設備，如直流式電漿輔助化學氣相沈積(DC PECVD)、對準曝光機、場發射測試系統、四點探針測試平台及薄膜可見光穿透率量測裝置等。 本文將展示以150℃∼300℃之低溫製程，在可撓性基板上成長奈米碳管。一般的奈米碳管合成技術，往往需要高溫製程，通常會超過500℃，所以縱使有高技術的控制成長方式，仍會限制了基材的選擇性和影響整個製程技術，這樣的製程可能會對其他部份的元件造成損害。尤其是在發展可撓性顯示器上更是一大瓶頸，因為可撓性材料通常以塑膠材質為主，其無法承受如此高溫。故本文研究如何降低製程溫度，使奈米碳管能於可撓性基板上成長，同時利用負型光阻與對準曝光機，搭配適當光罩製作陣列式的Ni金屬催化劑，使碳管能作區域選擇性的成長，進而製作場發射顯示器。 本文亦嘗試以自製的負型光阻與奈米Ni粉混合，作為成長奈米碳管之催化層，若能成功成長奈米碳管，該催化層製作方式有成本低廉之優勢。 至於陽極製作方面，則以電子束蒸鍍設備蒸鍍ITO薄膜，並加以熱處理，製作可撓性透明導電薄膜。在螢光層塗佈方面，以自調負型光阻充當黏著劑使用，將其混合後，可塗覆於ITO/PES可撓式導電膜上。在封裝方面，我們利用SU-8 2015 負型光阻本身熱性質之特性，進行熱固化程序，藉以達真空封裝之效果。這種利用光阻直接塗佈固化的方式製作空間支撐器（spacer），是相當簡便且新穎的作法。
並列摘要
The main work of this dissertation was to study flexible flat panel display with carbon nanotubes (CNTs), inclusive of the method to produce cathode and anode plates of display. Meanwhile, the simple method of package was showed. Besides using equipment in hand, some necessary experiment equipment was set up for completing experiments smoothly about the article like Direct Current Plasma-Enhanced Chemical Vapor Deposition (DC PECVD), Top Side Aligner, Field Emission Measurement System, 4-point Probes Measurement and UV-Vis Spectrophotometer. The dissertation demonstrates that growing CNTs on plastic substrate was under the process with low temperature from 150℃ ~ 300℃. Generally speaking, the process of producing CNTs always needs high temperature and that is always over 500℃. Even if having the high manipulation of growing CNTs, the method still limits the choice of the substrate material and has influence on integration processes. This kind of process may damage other parts of element. It is a tough work of developing flexible flat panel display especially, because that flexible material is made of plastics and can’t accept so high temperature process. Therefore, we studied how to decrease the temperature in process to grow CNTs on flexible substrate. At the same time, using negative type photoresist, Aligner and suitable mask produced catalyst of Ni dots array to make CNTs be able to be grown on patterned area selectively, and then field emission display can be manufactured. We also tried to mix negative type photoresist and nano Ni powder to be catalytic layer of growing CNTs. If succeeding to grow CNTs, the producing method of catalytic layer has an advantage of low cost. In regard to the producing method of anode plate, ITO film was deposited by E-beam Evaporator and was heated sequentially to produce flexible and transparent conductive film. As to coating phosphor layer, negative type photoresist was available as binder mixed with phosphor, and the solution was spread on ITO/PES. On the side of package, using the thermal properties of SU-8 2015 (negative type photoresist) ran heating and curing process, and then the effect of vacuum package was got. This is quite simple and fresh method to use photoresist to make spacer by coating and curing directly.