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  • 學位論文

溶劑型漿料光成型鋪層自動化技術開發

The Development of Coating Automation Technology in Solvent-based Slurry Stereolithography Rapid Prototyping System

指導教授 : 汪家昌
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摘要


本文主要在於改良溶劑型光硬化成型(solvent-based slurry stereolithography ,3S)系統的鋪層技術,之前的研究中由李[1]所架設的機台雖然可以成功的製作出陶瓷工件,但是在操作方面仍需由人工一個步驟一個步驟操作,在製作尺寸較大工件時,加工層數多,容易因為人為疏忽造成製程上的錯誤;原有的刮刀鋪層機構在製程上漿料容易在出料口有殘留,造成出口阻塞,一但發生阻塞在鋪層時會因為殘留的漿料使得鋪層的表面造成刮痕,使得下一層的漿料無法均勻鋪覆表面,讓兩層漿料間有間隙而無法黏結,使得工件製作出後會有分層的現象發生。 本研究改善了原有的鋪層操作,將每個人工操作步驟整合成自動操作的程序,如加工成型區的Z軸升降、刮刀鋪層動作的X軸方向移動、自動供料系統等等,大大的減少人為造成的失誤因素。研究上同時以更改不同刮刀的方式來達到改善漿料殘留的問題;新式刮刀經過鋪層實驗後,確實減少了殘留漿料所造成表面的刮紋,增加工件製程的效率。最後經由改善後的機台及新的漿料配方比例所製作的陶瓷試片,經高溫燒結後體積收縮率平均為46.26%,緻密度為98.06%,硬度最高約可達457.9MPa。

關鍵字

漿料 光成型 陶瓷粉末

並列摘要


This research is focusing on the improvement of the automatic slurry coating of the Solvent-based Slurry Stereolithograph (3S) Rapid Prototyping system. Although the existing 3S machine can produce ceramic parts but with very low successfully rate. It is because the coating process was done by operator which is, sometimes, human negligence in so many layers. Moreover, the scraper design is based on a narrow gap of the outlet to allow the slurry flow out, which will be easy blocked. This blocking ether makes inadequate slurry on the layer paving or makes scratches on the top of the layer. In this research, the slurry coating mechanism has been developed and integrated into the existing 3S system. Further more, the automatic slurry coating during the RP procedure is also achieved. The results show that the new slurry coating mechanism really reduces the inadequate slurry and avoid scratches. The automatic slurry coating procedure can increase the successfully rate from less than 20% to 60%. The final ceramic results after the high temperature sintering show an average flexural strength is 457.9 MPa, respectively, and a relative density of 98.06% has been achieved.

並列關鍵字

slurry stereolithograph ceramic

參考文獻


[1] 李耿芳,溶劑型漿料法之光硬化快速原型系統開發,碩士學位論文,國立臺北科技大學機電整合研究所,2010。
[21] 黃智德,陶瓷雷射燒結法工件之燒結精度研究,碩士學位論文,國立臺北科技大學製造科技研究所,2010。
[22] 陳世傑,溶劑型漿料光成型法之鋪層系統開發,碩士學位論文,國立臺北科技大學機電整合研究所,2010。
[25] 黃加輝,8051單晶片原理與應用-使用C語言,台北,台科大圖書股份有限公司,2008。
[3] C. K. Chua, S. M. Chou, T. S. Wong. “A Study of the State-of-the-Art Rapid Prototyping Technologies”, Int J Adv Manuf Technol, 1998, pp. 14:146-152.

被引用紀錄


羅均宇(2014)。溶劑型漿料法光硬化積層製造系統之迴轉式鋪料改良〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://doi.org/10.6841/NTUT.2014.00005
黃晨軒(2013)。溶劑型氧化鋯漿料光成型內鋪層系統開發〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://doi.org/10.6841/NTUT.2013.00753
游信樺(2012)。溶劑型漿料光成型設備鋪料槽內鋪層系統開發〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0006-1308201220210400
戴明杉(2013)。溶劑型漿料法光硬化積層製造系統之迴轉式鋪料開發〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0006-2907201315320700

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