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  • 學位論文

溶劑型漿料法之光硬化快速原型系統開發

Development of the solvent based slurry stereolithography rapid prototyping system

指導教授 : 汪家昌

摘要


本研究主要目的為開發溶劑型漿料法之光硬化(solvent based slurry stereolithography,3S)成型技術,並已用於製作出小型、複雜之工件。本研究在漿料中添加溶劑、可見光硬化樹脂及陶瓷粉末,溶劑讓漿料具有高流動性、低黏度,在鋪料時因為流動性好,所以可使漿料能均勻的鋪在平板上,層厚可非常薄;鋪層後,溶劑馬上揮發,漿料因而濃稠,成為半固化生胚;當大部分溶劑揮發後,剩下可見光硬化樹脂和陶瓷粉末互相黏結,加上選用的陶瓷粉末為極細且接近球形,所以生胚因內聚力的關係有較高的緻密度;最後藉由投射光罩使得樹脂選擇性硬化固定斷面形狀,並層層堆疊加工,直到完成工件;未硬化部分可藉由溶劑清洗驅除,而剩餘的部份為成品。 為驗證此創新的3S快速原型製程,本研究建構了一台全新驗證用快速原型系統,此系統包含X軸移動平台、Z軸升降平台、光罩系統和控制程式等裝置來完成加工流程,最後利用此系統來製作工件,工件先經過光罩產生軟體切出每層截面輪廓圖,而層厚設定為0.03mm,經過一連串動態光罩和X軸鋪層及Z軸下降,最後完成實體工件,可證明本3S製程可行,及本驗證用快速原型系統具有製作複雜之3D工件。

並列摘要


The purpose of the study is to develop a Solvent based Slurry Stereolithography (3S) Rapid Prototyping System. This system is applying dynamic mask to form a ceramic part for the requirement of high strength and accuracy. The approach of the innovative process is adding solvent into photopolymer and ceramic powder to become very low viscosity slurry. The low viscosity slurry can provide a good coating ability while adding a new thin layer. Also, the solvent will be vaporized within a short time after the recoating process. The capillary force will help new layer of material self assembly to the previous layers and bring a strong bounding force. After the vaporizing of the solvent, it becomes a semi-solid substrate which the powder is connected by the sticky resin. The dynamic photo mask will bring the light selectively curing the cross section of the forming part. After the process of every layer completed, the cube of the semi-solid substrate and the green part will send to dissolve. The substrate will be scatter in the solvent and the green part will remain. A system has been build to evaluate the proposed 3S Rapid Prototyping process. A 3Dcomplex benchmark part has been build using this system. The layer thickness is 0.03mm and the X-Y resolution is 0.07mm. further study is carrying on for better automation and material properity.

並列關鍵字

Rapid Prototyping Slurry Stereolithography

參考文獻


[2] 謝明哲, 霧化式微快速原型系統開發,博士論文,國立台北科技大學,台北市,2008年6月。
[16] 陳皇印,陶瓷雷射快速原型製程優化及應用,碩士論文,國立台北科技大學,台北市,2006。
[1] Hornbeck LJ., “Digital light processing: A new MEMS-based display” , 4th Sensor Symp., p 297–304, 1996.
[4] D. Kochan, C. K. Chua, “State-of-the-art and future trends in advanced prototyping and manufacturing”, International Journal of Information Technology, Volume 1, No 2, pp. 173-184, 1995.
[5] C. K. Chua, S. M. Chou, T. S. Wong, “A Study of the State-of-the-Art Rapid Prototyping Technologies”, Int J Adv Manuf Technol 14:146-152, 1998.

被引用紀錄


羅均宇(2014)。溶劑型漿料法光硬化積層製造系統之迴轉式鋪料改良〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://doi.org/10.6841/NTUT.2014.00005
黃晨軒(2013)。溶劑型氧化鋯漿料光成型內鋪層系統開發〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://doi.org/10.6841/NTUT.2013.00753
陳世傑(2010)。溶劑型漿料光成型法之鋪層系統開發〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://doi.org/10.6841/NTUT.2010.00302
陳金源(2011)。溶劑型漿料光成型鋪層自動化技術開發〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0006-1008201117325900
游信樺(2012)。溶劑型漿料光成型設備鋪料槽內鋪層系統開發〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0006-1308201220210400

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