透過您的圖書館登入
IP:3.142.96.146
  • 學位論文

製程排氣煙囪與外氣空調箱吸入口污染物氣流模擬分析

Facility Exhaust and MAU Air Pollution Simulation

指導教授 : 施陽正

摘要


近年來半導體及光電產業為我國高科技產業發展的主力,陸續有許多高科技廠房正在規劃興建或運轉中。由於這類廠房在製程中所使用之原料及化學品種類繁多,雖經相關排氣設備處理後至屋頂煙囪排放至大氣,但往往又被位於屋頂之外氣空調箱MAU(Make-Up Air Unit)吸入,造成二次污染或短循環現像。參考現行相關排氣口與進氣口之典型條例式法規,發現並不完全適用於高科技廠房。本研究是以美國FLUENT Inc.所開發流體力學AIRPAK模擬軟體,以實際廠房作案例模擬。考慮不同的外氣風向與風速下觀察屋頂外氣空調箱吸入口污染物之濃度。期望藉由模擬分析工具的運用能有效觀察相關污染物濃度的變化。 結果發現在外氣風速越低的情況下MAU吸入口污染物之濃度越高,且增加屋頂製程煙囪的排氣高度或增加排放速度皆能降低MAU吸入口污染物之濃度。這個結果與過程有助於在建廠設計規劃初期就能將大氣條件、MAU相對位置、製程煙囪的排氣高度作最佳考量。另針對目前正在運轉中之既有廠房無法改善煙囪高度時可依此模式並配合季節風向或外氣風速,在運轉時增加製程排氣排放速度,待季風過後或外氣風速加大時再回到正常運轉模式以節省能源。希望藉由本次研究方法與結果作為日後製程改善、建廠設計、運轉操作之參考。

並列摘要


The domestic semiconductor and TFT-LCD panel manufacture industries have became promising. There are so many fab. will be construct or operate. However, both industries use various chemical to process and the pollution control equipment dealing with emissions. The result shows that cross contamination is likely to happen through facility exhaust system to MAU on roof and to all the fab.The present code that about air inlet and outlet does not provide for hight-tech industry. In study uses the computer program AIRPAK as developed by FLUENT Inc. The simulation focused on the impact of different out side air direction and speed to analyze the inlet air pollution of MAU. It is anticipated that through the execution of this research project,the concept developed in this study can be applied to improve the air pollution. The results of simulation revealed that if out side air speed slowly,the inlet air pollution of MAU will be increase.The second it could increase high stack of exhaust or exhaust speed,the inlet air pollution of MAU will be decrease. Even if fab. is operation that can not change high stack of exhaust but we can increase exhaust speed to decrease the inlet air pollution of MAU until monsoon have passed or out side air speed increase. The results from this research could be used to design and improve process but also to operate.

參考文獻


[1] ASHRAE STANDARD 62.1-2004, "Ventilation for Acceptable Indoor Air Quality".
[14] 趙世閔,潔淨室外氣空調箱空氣水洗機去除無機酸鹼氣體污染物,碩士論文,國立台北科技大學能源與冷凍空調研究所,台北,2008。
[2] ACGIH (American Conference of Governmental Industrial Hygienists)美國工業衛生協會。
[4] Jhon H. Seinfeld, "Atmospheric Chemistry and Physics of Air pollution", 1985.
[7] 洪珮珮,半導體製程健康潛在危害簡介,勞工安全衛生研究所,勞工安全衛生簡訊第11期。

被引用紀錄


李俊儀(2012)。使用數值分析探討半導體廠房製程排氣汙染物排放情形〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0006-1807201212240000

延伸閱讀