高功率脈衝磁控濺射系統製備氮化鋁鉻薄膜之研究

A study of AlCrN thin films fabricated by High power impulse magnetron sputtering

蕭雨喬(Yu-Chiao Hsiao)

指導教授 ： 楊永欽

國立臺北科技大學/工程學院/材料科學與工程研究所/碩士(2013年)

https://doi.org/10.6841/NTUT.2013.00614

摘要

高功率脈衝磁控濺射(High Power Impulse Magnetron Sputtering, HIPIMS)為目前最新的鍍膜技術，其主要特色是在極短脈衝時間內靶材單位功率可達高kW/cm2以上，以及具有極高電漿密度、極高靶材金屬離化率。本研究使用高功率脈衝磁控濺射系統(HIPIMS)鍍製氮化鋁鉻薄膜，藉由改變脈衝參數(工作週期、脈衝頻率)以及製程參數，觀察靶電壓電流、尖峰功率密度、尖峰電流密度的變化，以及不同鍍膜參數對氮化鋁鉻薄膜性質的影響。由第一階段實驗結果發現，隨著工作週期的下降(5 %~1.5 %)，尖峰功率密度有大幅度的提升，在脈衝頻率714 Hz、工作週期1.5 % (ton/toff時間?21/1379 μs)時達到最高3.54 kW/cm2。而第二階段實驗中，使用不同工作週期和脈衝頻率鍍製之氮化鋁鉻薄膜屬於B1立方晶加上B4六方晶的雙相結構，薄膜橫截面呈現緻密柱狀晶結構，且尖峰功率密度對薄膜微結構有很明顯的影響，尖峰功率密度越高將會使薄膜從粗大柱狀晶轉變為越細小緻密的柱狀晶結構。當脈衝頻率1250 Hz、工作週期2 %時薄膜具有最高硬度值39.9 GPa及彈性係數417 GPa，且所有薄膜具有優異的附著性及抗磨耗性。綜合以上結論，本實驗使用HIPIMS系統能有效提升薄膜性質。

關鍵字

高功率脈衝磁控濺射系統 ； 氮化鋁鉻 ； 工作週期 ； 脈衝頻率

並列摘要

High power impulse magnetron sputtering (HIPIMS) is a newly developed coating technology, which is characterized for its ultra-high peak current and peak power density to achieve unique thin film properties, such as high hardness, good adhesion and tribological performance. The aim of this work was to systematically study the microstructure evaluation and mechanical properties of AlxCr1-xN coatings as a function of duty cycle and pulse frequency configuirations. The experimental results showed that the peak power density increased linearly as the duty cycle decreasing from 5% to 2% at constant frequency of 1000 Hz. A maximum peak power density of 2.76 kWcm-2 was achieved at the duty cycle of 2 % and repetition frequency of 833 Hz. A mixture of cubic and hexagonal AlxCr1-xN phases was found for each coating. The x value of AlxCr1-xN thin films changed from 0.72 to 0.75 and showed no direct relationships with duty cycle and repetition frequency. The peak power density had great influence on the microstructure evolution and altered the microstructure from coarse columnar to fine columnar structure. Re-nucleation grains were also found between columnar grains. The hardness increased with increasing frequency at constant duty cycle of 2 % and reached the optimum hardness of 39.9 GPa at x= 0.75. Good adhesion and wear resistance was observed for each coating. The critical load increased as the repetition frequency increased from 500 to 1250 Hz at the same duty cycle of 2%. Since the wear resistance for each coating was excellent, the duty cycle and pulse frequency showed limited influence on the wear resistance of thin films.

並列關鍵字

High power impulse magnetron sputtering ； Aluminum chrominum nitride ； duty cycle ； pulse frequency ； adhesion

參考文獻

[1] U. Helmersson, M. Lattemann, J. Bohlmark, A. P. Ehiasarian, and J. T. Gudmundsson, "Ionized physical vapor deposition (IPVD): A review of technology and applications," Thin Solid Films, vol. 513, 2006, pp. 1-24.

[2] I. Petrov, A. Myers, J. E. Greene, and J. R. Abelson, "Mass and energy resolved detection of ions and neutral sputtered species incident at the substrate during reactive magnetron sputtering of Ti in mixed Ar+N2 mixtures," Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol. 12, 1994, pp. 2846-2854.

[3] A. P. Ehiasarian, R. New, W. D. Münz, L. Hultman, U. Helmersson, and V. Kouznetsov, "Influence of high power densities on the composition of pulsed magnetron plasmas," Vacuum, vol. 65, 2002, pp. 147-154.

[4] Y. P. Purandare, A. P. Ehiasarian, and P. E. Hovsepian, "Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering," Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol. 26, 2008, pp. 288-296.

[5] P. E. Hovsepian, C. Reinhard, and A. P. Ehiasarian, "CrAlYN/CrN superlattice coatings deposited by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering technique," Surface and Coatings Technology, vol. 201, 2006, pp. 4105-4110.