沈積金屬薄膜於類鑽碳及其特性研究

Deposition and Characterization of Metal films on Diamond-like Carbon

盧侑瑋(Yu-Wei Lu)

指導教授 ： 王錫九

國立臺北科技大學/工程學院/材料科學與工程研究所/碩士(2009年)

摘要

類鑽碳膜是由碳原子組成並擁有半導體的性質，因此用來作為半導體元件的應用。本研究利用磁控濺鍍系統，將鉻及鈦金屬以不同參數鍍覆在類鑽薄膜基板上，經由不同溫度的熱處理後，對於類鑽薄膜的結構進行分析與探討。根據實驗結果在金屬膜厚為300nm並經過5分鐘400℃熱處理後的類鑽薄膜，其電阻由原先的4.32×108 Ω降低為8.92×107 Ω，原因在於鉻及鈦的原子經過高溫熱處理後擴散至類鑽內部，使類鑽薄膜除了藉由摻雜的方法以外，可利用此種方式提升類鑽的電性。

關鍵字

類鑽薄膜 ； 電性 ； 金屬鍍膜

並列摘要

DLC is consisted of carbon atmos and behave as semiconducting properties, we could use DLC on the applications of semiconductor devices. This research used magnetron sputtering system to sputter chromium or titanium films on the diamond like carbon (DLC) with different parameters. After annealing at distinct temperature, we analyzed the effect of the structure and electricity for DLC films. According to the results, when deposited 300nm thickness of chromium or titanium layer on the DLC substrate and annealed at 400℃ for 5mins, the resistance of DLC films decreased from 4.32×108Ω to 8.92×107Ω .For the metal atmos diffused into the DLC layer by higher annealing temperature. Except doping, we could use this way to increase the electrical properties of DLC films.

並列關鍵字

Electricity ； Diamond-like carbona ； Sputtering

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