本研究提出一種結合陽極氧化鋁(anodic aluminum oxide, AAO)薄膜及微機電系統(MEMS)製造技術的新型奈米多孔性(nanoporous)氣體感測器製程方法。利用陽極氧化鋁製程與乾蝕刻製程取代易受光學解析度所限之傳統光微影與電化學蝕刻製程,並可調控表面生成之孔徑寛度及深度,在感測器表面上產生均勻之奈米多孔結構,若配合奈米級氣敏材料之沉積,將使氣敏材料表面積大幅增加,以提高氣體感測工作範圍。氣體感測器為一薄膜(Membrane)結構,可由MEMS之KOH濕蝕刻製程製作,內部具有微加熱器與溫度感測單元,用以增強對氣體敏感性(Sensitivity)與感測器回復性(Recovery)之需求。本研究主要發展陽極氧化鋁、乾蝕刻與微製造整合製程,並探討以物理氣相沉積法(Physical Vapor Deposition, PVD)沉積奈米級二氧化鈦(TiO2)薄膜於感測器多孔性表面之可行性,初步結果顯示此新型元件可應用及相容於智慧型生化感測晶片之未來需求。
A novel and nanoporous gas sensor processed by anodic aluminum oxidation(AAO) thin film and micro-electromechnical systems (MEMS) techniques is presented. combining AAO with dry etch processes, homogeneous and nanoporous surface of the sensor can be effectively configured by modulating various hole diameters and depth, thus replacing conventional photolithography and electrochemical etch. New gas-sensing nanofilms deposited on the nanoporous surface are able to provide relatively high surface area ratio to enhance working range of the sensor. Metal heaters and thermometers for the use of sensitivity enhancement and device recovery are embedded into a thin dielectric membrane fabricated by KOH wet etching process. The process integration of AAO, dry etch and microfabrication is mainly developed and a feasibility study of PVD TiO2 thin film deposition upon the porous device is also provided. Our promising experimental results reveal that the miniature and cost-effective devices are not only compatible, but applicable to smart bio-chemical sensor chips of next generation.