- 學位論文
以射頻磁控濺鍍技術製備GZO及IGZO薄膜殘留應力之研究
Residual Stress in GZO and IGZO Thin Films Prepared by Radio-Frequency Sputtering Technique
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延伸閱讀
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- 張佳琳（2014）。以射頻磁控濺鍍法沉積IGZO薄膜之特性研究〔碩士論文，中原大學〕。華藝線上圖書館。https://doi.org/10.6840/cycu201400689
- 宋長泰（2008）。聚焦式離子束後處理對射頻電漿輔助化學氣相沉積法製備之類鑽碳膜的影響〔碩士論文，大同大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0081-0607200917245195
- 沈家裕（2012）。Thickness and Surface Profile Measurement of Thin Film by Using Spatial Carrier Phase Shifting Technique〔碩士論文，國立中央大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0031-1903201314455051
- 黃炳文（2007）。The study of a titanium oxide film with self-cleaning ability prepared by plasma enhanced chemical vapor deposition technique〔碩士論文，國立虎尾科技大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0028-1501201314421489