電子槍熱蒸鍍紫外光薄膜之研究

A study of optical thin film deposited by e-beam deposition for UV application

陳宏彬(Hung Pin Chen)

指導教授 ： 劉宗平 ； 吳 坤 東

元智大學/工程學院/電機工程學系/碩士(2003年)

摘要

無資料

關鍵字

抗反射膜 ； 三氧化二鋁 ； 二氧化矽 ； 紫外光薄膜

並列摘要

Early in 1817, Fraunhofer had made the anti-reflection thin films with acid-corrosion method. However, the optical films were not developed well until the vacuum deposition equipment appears. Since that application of the optical thin films were widely used due to the military requirements.
Recently, because of the progress of rapid lithography technique and the applications in space science, the optical thin films were enormously studied for UV applications. In the space telemetry, for example, the scientists explore the unknown phenomenon of lighten in the space, the measurements of the red sprit, the Huggins absorption bands. Hence, the optical thin films become a very important technology in UV applications.
In this thesis, Al2O3 and SiO2 optical thin films for UV applications deposited by e-beam evaporation technique were studied. We had executed a series of measurements on the optical constants of refractive index, extinction coefficient, and transmittance to study the optical properties of the materials, and scanned the sample surface to understand the amorphousness and surface roughness of the microstructure. For this study, the AR coatings composed of Al2O3 and SiO2 thins for UV applications were prepared. Passing through this study, we expect to obtain more information about the optical thin films in UV applications in the future.

並列關鍵字

anti-reflection thin films ； Al2O3 ； SiO2 ； UV-coating