基於X光光刻製造技術之凹面光柵分光晶片之設計與檢測

Design and Measurement of Concave Grating Spectrometer Chip Based on X-ray Lithography Technique

梁茂璋(Mao-Chang Liang)

指導教授 ： 張明文 博士 ； 柯正浩 博士

元智大學/工程學院/電機工程學系/碩士(2004年)

摘要

本論文研究凹面型光柵分光晶片的設計與檢測。旨在介紹如何利用繞射光柵的理論與原理，來設計一個適合使用X光光刻技術在矽基材製作之凹面型光柵。
首先說明設計的方法與基礎，根據傳統繞射光柵的理論，發展以羅倫圓為基礎的凹面型光柵設計的技巧，再利用級數展開法來分析凹面型光柵之光學特性；作設計參數的分析。本論文也將提出以X光光刻製造技術來製作此凹面型光柵，並展示所製作之凹面型光柵。
最後進行凹面型光柵分光晶片的光學特性量測，分光晶片之解析度是0.6nm，通道頻寬是0.4nm。

關鍵字

光柵 ； 凹面型光柵 ； 羅倫圓

並列摘要

The design and measurement of a concave grating spectrometer chip have been studied in this thesis. By using the theory of diffraction grating, we designed the concave grating which has been fabricated on a silicon wafer by x-ray lithography technique.
Firstly, a design principle and rule based on the theory of diffraction grating were stated, and we took Rowland circle into our basic design concept, then analyzed the optical performance of concave grating by series expansion. We also brought out the idea of fabricating the concave grating by x-ray lithography technique, and the concave grating has been presented in this thesis.
Finally, we measured the optical property of the concave grating spectrometer chip. Its results: resolution of 0.6nm and channel spacing of 0.4nm match our design.

並列關鍵字

GRATING ； CONCAVE GRATING ； ROWLAND CIRCLE

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