應用於LCD微影製程覆蓋誤差分析

Lithography Overlay Error Analysis of LCD Application

江震宇(Chen-Yu Chiang)

指導教授 ： 柯 正 浩

元智大學/工程學院/電機工程學系/碩士(2005年)

摘要

隨著LCD產業日益發展，微影製程技術亦相對漸形重要。如何在一次又一次的重複曝光中，使其疊對誤差能夠控制在許可的範圍內，其正確的補償參數將是不可或缺的因素之一。本論文中將針對此部分之疊對誤差精度進行探討。以既有之微影製程為架構，針對可能產生之疊對誤差原因、種類進行分析，再以最小平方法之理論基礎，建立相關模型，期望能藉此找出一實用且精確之參數估計方式，以幫助工程師在現場作出即時、正確的判斷，而達到改善製程品質、提升設備總體效能之目的。研究內容主要是透過各種估測模型來進行比較，進而產生較為精準的微影覆蓋誤差模型，將此參數做為曝光機台補正之依據，以達到疊對誤差之補償。

關鍵字

微影製程覆蓋誤差

並列摘要

As LCD industry being growing, Lithography technology is relatively important. How among Lithography Process again and again, make Overlay can be controlled in the range permitting, the correct compensation parameter will be one of the indispensable factors . Will probe into Overlay Accuracy of this part this thesis. Regard Lithography Process that has already the structure had as, analysis to Overlay Error reason , kind that may produced , and then with the theoretical foundation of the least squares method , set up relevant model , expect to be able to find out the practical and accurate parameter and estimate the way by this, in order to help the engineer to make the instant , correct judgment live , and achieve and improve the quality of the products , purpose to raise overall efficiency of the equipment. The research contents are mainly to estimate the model of examining to compare through various kinds of, and then produce comparatively perfect Lithography Overlay model, do for Lithography Process the basis that is added and corrected of this parameter, achieve the purpose that overlay error compensates.

並列關鍵字

Lithography, LCD