本研究以氣旋式大氣電漿系統對聚偏二氟乙烯(poly vinylidene fluoride, PVDF)薄膜進行表面改質。本研究可分為純氬氣電漿與氬氣電漿添加反應性氣體二部份,而反應性氣體包含O2、H2O與、H2O2與CH4。分別探討改變處理時間、電漿功率、氬氣流率、噴頭至基材距離與反應性氣體流率等操作參數,並測量水及二碘甲烷接觸角,再利用Owens-Wendt-Rabel-Kaelble(OWRK)法計算表面自由能。研究過程中,利用光放射線光譜儀檢測電漿物種變化情形,並藉由紅外線熱像儀測量電漿溫度與基材溫度之變化,以及使用高畫素數位相機拍攝改變不同參數下,電漿之輝光放電現象。改質後薄膜物理性質分析方面為使用掃描式電子顯微鏡與共軛焦雷射掃描式顯微鏡以觀測表面形貌與粗糙度,薄膜化學性質分析方面則為利用X光光電子能譜儀測量表面化學鍵結與元素比例之改變。研究結果顯示,經過電漿改質後之聚偏二氟乙烯薄膜,其表面性質由疏水性變為接近超親水性,且其親水性可保持達250小時。
The target of this study is to use cyclonic atmospheric pressure plasma to modify poly (vinylidene fluoride) (PVDF) membrane surface. It can be divided to two parts of this study. One is to use pure argon plasma, the other is to add reactive gas to enhance argon plasma. The reactive gas of this study is water, hydrogen peroxide, oxygen and methane. It examines the influence of plasma operating parameters including in treatment time, power, argon flow rate, distance from nozzle to substrate and reactive gas flow rate. The change of PVDF membrane surface was calculated by Owens-Wendt-Rabel-Kaelble (OWRK) method. During cyclonic atmospheric pressure plasma processing, the plasma species were analyzed by optical emission spectroscopy (OES). In addition, the temperature variations of plasma were determined by infrared thermal imager. The physical property and chemical composition change of plasma treated PVDF membranes are also discussed. The surface morphology and roughness were observed by scanning electron microscopy (SEM) and confocal laser scanning microscopy (CLSM). The chemical composition and element ratio of cyclonic atmospheric pressure plasma treated PVDF membrane surface were analyzed using X-ray photoelectron spectroscopy (XPS). The aging test results of cyclonic atmospheric pressure plasma treated PVDF membrane can keep up 250 hours, indicating its duration. In summary, this study determines that the cyclonic atmospheric pressure plasma efficiently improves the hydrophilicity of PVDF membrane surface.