- 學位論文
以四氟乙烷電漿對微生物纖維素膜及硝酸纖維膜進行疏水化處理與表面特性探討
The study of tailoring surface properties of microbial cellulose membrane and nitrocellulose membrane by 1,1,1,2 -tetrafluoroethane plasma treatment and the surface characterization
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摘要
氟化非晶碳膜(a-C:F films)廣泛應用於光學工業、生醫材料、疏水材料及半導體工業等。本研究使用射頻式低壓電漿聚合方式於微生物纖維素膜及硝酸纖維膜表面沉積氟碳薄膜，實驗使用射頻式(Radio frequency, RF)低壓電漿反應器，其頻率為13.56 MHz，單體選擇為單鍵四氟乙烷(1,1,1,2-tetrafluoroethane, C2H2F4)。探討不同電漿參數，包括在沉積時間、電漿功率以及腔體壓力。薄膜表面特性分析方面，並藉由靜態接觸角量測儀(Static Contact Angle, CA)、光學薄膜厚度量測儀(Optical thin-film thickness detector)、原子力顯微鏡(Atomic Force Microscopy, AFM)、掃描式電子顯微鏡(Scanning Electron Microscope, SEM）及微區能量散佈分析儀(Energy Dispersive Spectrometer, EDS)，並使用Owen法計算電漿處理後基材之表面自由能。 結果顯示，在最佳化參數製程下，兩項膜材皆可獲得水滴接觸角大於150°之超疏水表面，在硝酸纖維膜之甘油接觸角也可達160°而造成超疏油表面；表面自由能方面，經電漿處理後，可降低至10 mJ/m2 ；而沉積之薄膜厚度會隨著電漿功率增加而有上升之趨勢，EDS量測顯示，經四氟乙烷電漿處理過後，可觀察到氟原子在基材表面，造成其疏水性質提升。
並列摘要
Low-pressure plasma polymerization technique was employed to deposit fluorocarbon thin film on microbial cellulose membrane and nitrocellulose membrane substrates in this study. The low-pressure plasma, generated with radio frequency power at 13.56 MHz, and monomer selected for single bond of 1,1,1,2-tetrafluoroethane (C2H2F4). The investigation examined different operational parameters including in deposition time , plasma power, and chamber pressure. The surface characteristics of the plasma polymerized films have been analyzed by Static Contact Angle measurement (CA), optical thin-film thickness detector,Scanning Electron Microscope (SEM), Energy Dispersive Spectrometer (EDS). In addition, the contact angle results based on Owen method revealed that surface free energy would decrease after C2H2F4 plasma treatment. As a result, the fluorocarbon film under optimized operational parameters prepared in this study obtained water contact angles greater than 150◦ on MCM and NC membrane. Glycerol contact angle up to 160° lead to super-oleophobic surface on nitrocellulose membrane. The surface free energy of plasma polymerized films can decrease to 10 mJ/m2, increasing deposition thickness of C2H2F4 plasma polymerized films was achieved in rising RF plasma power. EDS analysis indicated after C2H2F4 plasma treatment, we can obtain F element on substrates surface, lead to enhance the hydrophobic properties.
參考文獻
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