隨著LTPS (Low Temperature Poly-Silicon) 產業的快速發展,對產品品質的要求也越來越高,為確保廠內的量測系統可獲得正確且有效的量測數據,本研究將利用量測系統分析 (Measurement System Analysis, MSA) 方法來改善光學量測系統 (Display-Measuring-System, DMS) 之量測能力,其中,運用統計方法-變異數分析 (Analysis of Variance, ANOVA) 及品管手法-魚骨圖來評估量測系統變異的來源,進而加以改善,不僅能有效降低量測系統的變異由32.18%及59.74%減少至4.17%及8.02%,相對也提升量測數據的可信度及準確度。待量測系統穩定後,再利用標準光源對廠內不同的光學量測系統進行差異比對找出其差異性及相關性,作為日後預測光學量測系統輝度值的應用。
Along with the rapid growth of the LTPS industry, the demand for quality level is getting higher and higher. To assure that our measurement system can obtain the correct and effective measurement data, this study will apply the MSA approach to improve the measurement capability of DMS, and take advantage of the ANOVA analysis of statistics method and Cause-and-Effect Diagram of Quality tools to evaluate the source of the measurement system’s variation, then improves it, not can only reduce the measurement system’s variation effectively by 32.18% and 59.74% reduces to 4.17% and 8.02%, but also to improve the reliability and accuracy of the measurement result. After steady state of measurement system, uses Standard Light Source Measurement System to find out the correlation and difference from the deviation analysis of all various optical measurement systems, as will forecast the optical measurements system’s luminance in the future the application in the company.