石墨烯電子元件與半導體技術之結合

Semiconductor Processes Technology for Graphene Electronics

鄧博元(Po-Yuan Teng)

指導教授 ： 邱博文

國立清華大學/電機資訊學院/電子工程研究所/博士(2016年)

摘要

石墨烯，一個單原子層碳原子二維蜂窩狀結構，由於其獨特的物理特性，成為相對論凝聚態物理學中的一個新興模型。基於其獨特優良的光學與電學特性，石墨烯很有機會成為下一代電子產品應用的主流。 2010年 Geim 和 Novoselov 由於成功的分離出單層石墨烯獲得了諾貝爾物理學獎。 石墨烯是最薄的天然二維材料，只有一個原子厚度。目前，石墨烯可藉由在晶片級上的過渡金屬表面利用化學氣相沉積達到30英寸。對於相關流程石墨烯電子器件的製造，目前還有幾個障礙需要克服。本研究中，我們嘗試將半導體工藝與石墨烯結合，以促進石墨烯商業化與工業化的應用。第一章將介紹石墨烯的基本性質的概述。第二章將介紹如何製造石墨烯電子元件，但對於石墨烯電子產品成為主流，仍有一些生產流程上的困難需要克服。我們嘗試將石墨烯的電子工藝與半導體產業相結合，其中的第一步是改善石墨烯備製方式。因此，第三章將透過遠端銅蒸氣催化提供高效率和高成本效益的石墨烯化學氣象沉積系統，以改善目前的石墨烯製備方案。在第四章中，我們將展示雷射雕刻石墨烯技術，可精準控制到一個原子層的解析度，此技術也可以用來圖形化石墨烯。雷射雕刻石墨烯的技術，將大幅改善過去的石墨烯圖形化技術，且有助於石墨烯電子元件的電性改善。第五章，我們建立了石墨烯雷射雕刻技術的相關理論模組與分析。前五章，我們提出了有關石墨烯的電子產品製造過程中的兩個重要的技術突破，第六章中我們試圖通過使用這些新的石墨烯製造工藝製作石墨烯光電探測器，並得到相當有趣的成果。

關鍵字

石墨烯 ； 化學氣象沉積 ； 奈米 ； 光感測器 ； 氧化

並列摘要

Graphene, an isolated mono-atomic carbon layer conformed into two-dimensional honeycomb lattice building blocks, has triggered off numerous novel research possibilities, due to its intriguing physics and as an emerging paradigm for relativistic condensed matter physics as well as showing great promise for its application in next generation electronics. In 2010 the Nobel Prize in physics was awarded to A. Geim and K. S. Novoselov for their pioneer work in solating single-atomic-layer of graphite sheet on silicon dioxide. Graphene is the thinnest natural 2D material consisting of hexagonal carbon network in only one atom thick. Now a days, graphene can be synthesized by chemical vapor deposition on transition metal surface in wafer scale and even up to the 30 inches. For the relevant processes for graphene electronic devices fabrication, there are currently several hurdles to be overcome before widespread industrial production of graphene-based devices becomes a reality. In the course of this dissertation, we try to link semiconductor processes and adapt them to work with gaphene. Chapter 1 will introduce an overview of the fundamental properties of graphene. Graphene has many outstanding properties, of special importance for graphene electronics is the electrical properties. How to fabricate graphene electronics is described in chapter 2, but for graphene electronics production to reach mainstream status, there are still a few difficulties to be overcome. Furthermore, we try to combine the graphene electronics process with the semiconductor industry. The first step for the process is graphene film fabrication. Chapter 3 will introduce an efficient and cost-effective CVD process by remote catalyzation in the form of copper vapor. In chapter 4, we will show the laser engraving can be used in layered materials such as graphene with enough precision to ablate one atomic-layer each time through the precise control of the surface reaction. Photochemical elimination of an individual layer becomes possible, while leaving the next exposed layer intact after processing. This tech-nology also can be used to pattern the graphene. We also discuss the theoretical framework for layer-resolved thinning technology in chapter 5. So far, we provide two important technological breakthroughs about graphene electronics fabrication process. In chapter 6, we try to fabricate a graphene photodetector by making use of these new graphene fabrication process. In short, graphene has followed a relatively fast paced track (around 10 years) from its discovery down to being actively considered as the key material in technologies close to industrial production and availability to the wider public. It is clear that this direction will lead to exciting new possibilities and has certainly opened the door for the active study of other 2D layered materials, such as transition metal di chalcogenides.

並列關鍵字

graphene ； CVD ； nano ； photodetector ； oxidation

參考文獻

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