- 學位論文
製程參數對高功率脈衝磁控濺鍍製備氮化鉬薄膜結構與性質之影響
Effects of Process Parameters on Structure and Properties of Molybdenum Nitride Thin Films by High-Power Impulse Magnetron Sputtering
並列摘要
abstract hide
延伸閱讀
- Su, P. C. (2018). 模板效應對磁控濺鍍之氮化釩薄膜織構演變之影響 [master's thesis, National Tsing Hua University]. Airiti Library. https://www.airitilibrary.com/Article/Detail?DocID=U0016-1803201914471972
- Chung, C. S. (2021). 佔空比及工作氣壓對高功率脈衝與非平衡磁控共濺鍍製備氮化鈦鋯鍍層結構和性質的影響 [master's thesis, National Tsing Hua University]. Airiti Library. https://www.airitilibrary.com/Article/Detail?DocID=U0016-2412202116182280
- 溫靖嫻（2006）。以反應性脈衝磁控濺鍍製備氮化鋯薄膜與薄膜性質測定〔碩士論文，元智大學〕。華藝線上圖書館。https://www.airitilibrary.com/Article/Detail?DocID=U0009-1207200613193800
- 盧佳暐 (2012). Characterization of Structure and Mechanical Properties of TiZrN Thin Films Deposited by DC Unbalanced Magnetron Sputtering: Effect of Nitrogen Flow Rate [master's thesis, National Tsing Hua University]. Airiti Library. https://www.airitilibrary.com/Article/Detail?DocID=U0016-2002201315243091
- 藍銀鋒、王文生、陳佩均、何主亮（2008）。Optical and Electrical Properties of Thermionic-enhanced Deposition of Indium Tin Oxide Films by Using DC Magnetron Sputtering。真空科技，21(1&2)，6-15。https://doi.org/10.29808/JVSROC.200806.0001