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  • 學位論文

硒化錳鋅磊晶層及奈米結構的成長與特性分析

Growth and Characterization of Zn1-xMnxSe Epilayer and Nano-structure

指導教授 : 周武清
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摘要


以分子束磊晶法在砷化鎵 (001) 基板上成長硒化錳鋅磊晶層,並且利用反射光譜及光激螢光譜研究磊晶層的光學特性。另外量測變溫光激螢光譜,並利用Varshni模型及 O’Donnell模型對實驗值做擬合。利用這兩個模型分別可以得到與聲子能量有關之擬合參數 β (113 K至 306 K) 及 (7 meV至10 meV)。利用Arrhenius圖法計算活化能,得知活化能會隨著錳含量的增加而減少。另外也 利用散射模型對變溫光激螢光譜訊號的半高寬做擬合。   除了研究硒化錳鋅磊晶層之外,我們也利用分子束磊晶法在砷化鎵基板上成長稀磁性半導體,硒化錳鋅 (Zn0.96Mn0.04Se),並且將碲化鋅量子點埋入其中。碲化鋅量子點平均覆蓋的厚度分別為1.7、2.0、2.3、2.7、3.0、3.3個原子層。能量在2.15 eV至2.41 eV間的光激螢光之訊號是由碲化鋅量子點所造成的,而在1.9 eV至2.0 eV之間的訊號則是由硒化錳鋅中的錳離子所造成。

並列摘要


Zn1-xMnxSe epilayers were grown on the GaAs (001) substrates by the molecular beam epitaxy (MBE). Optical properties were studied by the reflectance (R) and photoluminescence (PL) spectroscopy. The temperature dependence of the energy gap, measured by the PL spectra, was fitted by the Varshni’s and O’Donnell’s model. The phonon energy related fitting parameters β (113K to 306K) and (7meV to 10meV) were obtained from the Varshni’s and O’Donnell’s fits, respectively. Activation energies calculated from the Arrhenius’ plot of the integrated PL show a decrease with the Mn composition. The PL line-width broadening with the temperature was fitted by Γ(T)= Γ0+ΓaT+ΓLO1/[exp( LO1/kT)-1]+ ΓLO2/[exp( LO2/kT)-1]+Γiexp(-/kT). In addition to the study of Zn1-xMnxSe epilayers, the ZnTe quantum dots (QDs) were grown in the diluted magnetic semiconductor, Zn0.96Mn0.04Se, matrix on the GaAs substrate by molecular beam epitaxy. The averaged coverage of ZnTe was 1.7 ML, 2.0 ML, 2.3 ML, 2.7 ML, 3.0 ML, and 3.3 ML. The PL peak appears at energy between 2.15 eV and 2.41 eV is attributed to the radiation from ZnTe QDs. While, the peak at energy between 1.9 eV and 2.0 eV is due to emission from the intra-Mn2+ of Zn0.96Mn0.04Se.

參考文獻


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