電鑄的技術是LIGA製程中重要的一環,影響光阻微結構的複製甚大。本研究深入在LIGA 製程中微電鑄的製程,使用鎳添加劑並搭配製程參數變更來研究影響電鑄品質之因素,以期提升電鑄模仁的機械性質、表面粗糙度與平整度,進而提高光碟成型時的品質與良率。 論文採用胺基磺酸鎳鑄液並添加不同含量的鎳半光澤劑於鑄液中,並配合不同的電流密度與電鑄液溫度參數。從研究結果中,發現加入鎳半光澤劑所電鑄的模仁,其硬度明顯提高,在電鑄液溫度60℃、電流密度13.5ASD、150ml鎳半光澤劑的條件電鑄出的模仁硬度最大高達264HV,跟原始條件(硬度149.5HV)相比硬度提升了76.58%,並且沒內應力所產生的變形。從金相實驗中觀察鑄層橫截面組織,發現加入鎳半光澤劑會使鎳沉積由柱狀沉積轉變為細小層狀沉積,為硬度提升的主要因素。表面粗糙度方面則是利用AFM來量測,在高溫度與低電流密度或加入鎳半光澤劑可以產生較細密的結晶,因此在此條件下可獲得較小粗糙度。在厚度方面,提高溫度與電流密度時晶粒沉積速率越快,在相同時間下沉積的厚度越厚,但是會有模仁內外厚度差異太大造成平整度不佳的缺點,在相同條件下鎳半光澤劑量越多,也會加速鎳的沉積速度,在相同條件下沉積模仁厚度越厚。 本研究中,可以充分了解電鑄製程中鎳半光澤劑的影響,以及在不同電鑄液溫度和電流密度下產生的變化,在電鑄製程時可依模仁需求挑選最適合且最有經濟效率的參數。
Micro electroforming technology of the LIGA process is very important and has a great effect on the replication of micro-structure. In this study, the effects of processing and adding Ni semi-bright during electroforming process on disc stamp quality were been investigated. From the result of study, the stamp of electroforming with Ni semi-bright has bigger hardness. The hardness of stamp has increased 76.58% and reaches the maximum when solution temperature, current density and Ni semi-bright are 60℃, 13.5ASD and 15ml, respectively. The improving of hardness is Ni deposit transition form pillar to layer forms that can be observed the cross section via a metallographic. For the hardness and surface roughness of the stamp, the higher hardness and lower surface roughness need high solution temperature, low current density and adding Ni semi-bright. The higher solution temperature, higher current density and adding Ni semi-bright will get thicker and not uniform stamp. Form this study, it will lead to a better understanding on the electroforming characteristics. We can choose and adjust the parameters to get suitable and economic efficiency way during electroforming process.