聚苯乙烯微奈米球之製備、自組裝及其應用

Fabrication, self-assembly arrangement and application of polystyrene micro/nano spheres

吳旭剛(Hsu-Kang Wu)

指導教授 ： 李有璋

中原大學/工學院/機械工程研究所/碩士(2013年)

https://doi.org/10.6840/cycu201300899

摘要

膠體微影技術不受光學繞射限制，可精確定義圖案尺寸，因此，成為近年來微影技術的發展重點。本論文的主體分成聚苯乙烯微奈米球的合成、自組裝以及後續蝕刻三個部分。首先利用乳化聚合法與分散聚合法製備聚苯乙烯微奈米球，得到奈米、次微米以及微米等級粒徑的微球；接著以自組裝氣液界面法對矽基板進行排列，使次微米與微米等級的粒徑微球達到單層六角晶格最密堆積排列；最後以平均粒徑450 nm、550 nm與700 nm三種粒徑的PS球作為蝕刻擋層進行電漿蝕刻，以兩段式蝕刻的方式得到週期性次波長錐體結構。

關鍵字

聚苯乙烯微奈米球 ； 自組裝排列

並列摘要

Colloidal lithography is one of the developing lithography techniques for the precision pattern definition without the limitation of optical diffraction. This study developed the fabrication, self-assembly arrangement and etching of polystyrene micro/nano spheres. The emulsion polymerization and dispersion polymerization were introduced to prepare nano, sub-micron and micro particle of polystyrene spheres (PS), respectively. Then using of the self-assembly arrangement to build the hexagonal close-packed sub-micron and micron spheres on the silicon substrate. Finally, three sizes of PS spheres, 450 nm, 550 nm and 700 nm, were used as etching masks in two-step etching process approach to fabricate periodical subwavelength pyramidal structure.

並列關鍵字

polystyrene micro/nano spheres ； self-assembly arrangement

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