膠體微影技術因製程設備、材料成本較低與可製作數十微米到數奈米的尺寸結構之特點,因此成為近期微影技術發展之重點。然而為了解決傳統粒子排列方式受人為因素難以控制排列或排列區域較小之問題,因此本論文是以自組裝氣液界面法為基礎,開發膠體微影的自動化設備,其內容著重於設備設計與製程開發兩個部分。 首先自動化設備中分為5大模組,其模組中利用步進馬達為旋轉動力源,藉由滾珠螺桿將旋轉運動轉變為直線運動,使各模組以此方式達成設計要求動作,並藉由可程式邏輯控制器精確控制其製程參數與各模組間相互配合,以降低人為之影響;接著以此開發完成的自動化設備進行製程開發,並完成4吋全晶圓面積之完整排列,藉由探討單層三角晶格最密堆積中晶粒內裂縫、與產生原因及相對應之製程參數,利用懸浮液中去離子水比例由3.4 g降低至0.68 g、注射次數由3次增加至4次及擋板回壓距離由0.1 mm增加至1 mm,始晶粒內裂縫與單粒子空洞之缺陷降低;注射幫浦模組馬達轉速由5 rpm降低至1 rpm,使粒子堆積之缺陷降低。最終分析人工與設備排列之晶粒差異及原因。
Colloidal lithography has been recently developed since it can fabricate micro- to nano-size structure for cost-effective process and material. However, the colloidal lithography has the difficulty to control the sphere arrangement manually, and the effective arrangement area is small. This thesis focuses on the development of automation equipment based on the gas-liquid interface floating method of the colloidal lithography. The equipment design and process development are two portions of this study.. The automation equipment is divided into 5 modules Each module uses the stepping motor and the ballscrew to transform the rotateing motion to a linear motion. Programmable logic controller (PLC) is used to precisely control process parameters and the interaction between the modules to reduce the impact of the human factor. For the process, causes of defects and the corresponding process parameters in the hexagonal close packed arrangement have been discussed. Defects were reduced greatly by increasing the concentration of the suspension solution for reducing the DI-water from 3.4 g to 0.68 of , increasing injection number of the solution from 3 to 4 times, increasing the backward pushing distance of the baffle from 0.1 mm to 1 mm, and reducing the injection amount of the solution from decreasing the pump module motor speed from 5 rpm to 1 rpm. The final analysis of artificial and equipment arrangement of grain differences and reasons.The development process by automation equipment has arranged successfully the polystyrene spheres on a 4-inch wafer.