氧化鎳電致色變性質之研究

Study on the NiOx Electrochromic Properties

林鵬仕(PENG-SHIH LIN)

指導教授 ： 陳夏宗

中原大學/工學院/機械工程研究所/碩士(2008年)

https://doi.org/10.6840/cycu200900613

摘要

本實驗使用反應性射頻磁控濺鍍方式製備氧化鎳薄膜，藉由改變
不同的氧氣流量、濺鍍功率、薄膜厚度等製程參數，找出各條件對薄
膜結構、表面型態、電化學性質及光學特性影響之關係。電化學分析
則採用1M 的氫氧化鉀水溶液為液態電解質進行研究。
由實驗結果得知在薄膜特性方面，氧氣流量提升至20sccm，氧
化鎳繞射峰會有強度減弱及偏移的現象。濺鍍功率從0.5KW 提升至
2.0KW 時，除原先43°有一明顯繞射峰外，增加了37°、62°、75°及
79°等位置；表面粗糙度亦從2.995nm 增加到4.230nm。由循環伏安
儀及紫外光譜儀撘配表面特性結論進行分析，可知氧化鎳電致色變性
質與製程參數有關，且有一定的趨勢。實驗中以最佳參數濺鍍，即在
不通氧氣、濺鍍功率2.0KW、氬氣流量40sccm 製備厚度為200nm 之
氧化鎳薄膜，具有最佳的光學密度差(在波長550nm 之可見光下)值為
0.53，及最大氧化峰與還原峰值，分別為7.844 mA/cm2 與-5.531
mA/cm2。綜合上述研究結果，氧化鎳薄膜能有效降低穿透率，而與
其他材料比較，更具商業化應用之潛力。

關鍵字

電致色變材料 ； 氧化鎳 ； 反應性射頻磁控濺鍍 ； 光學密度差 ； 電化學分析 ； 氧化峰 ； 還原峰

並列摘要

In this experiment, the nickel oxide thin film was prepared by
reactive RF magnetron sputtering with different preparing conditions.
Then, the processing parameters such as the oxygen flow, sputtering
power, and the thickness of the thin film are tuning to establish the
relations among the processing parameters, the microstructure, the
morphology, the electrochemical behavior and the optical properties. The
1M KOH solution was used as an electrolyte in the measurement of
electrochemistry.
As the results in the thin film characteristic, we find that the
intensity of the oxidizing nickel diffraction peaks was abated and the
peaks were deviated from original position. With the increase of the RF
power, the oxidizing nickel diffraction peaks will add three positions such
as 37, 62, 75, and 79 degrees. Then, the surface roughness of nickel oxide
thin film also increased from 2.995nm to 4.230nm. From the results of
cyclic voltmmetry, UV spectrophotometer and surface characteristics, we
find that the electrochemical behavior of nickel oxide thin film have
relations with the processing parameters and steady trend.
We made the nickel oxide thin film with the optimal sputtering
conditions such as the oxygen flow of 0sccm, sputtering power of 2.0KW,
thickness of 200nm, argon flow of 40sccm. At wavelength 550nm, it had
the best optical density change is 0.53, the maximum oxidization peak is
7.844mA/cm2 and the maximum reduction peak is -5.531mA/cm2. In the
results, the nickel oxide thin film can reduce the transmittance effectively.
Comparing to the other materials, it also show the promising of
commercial applications.

並列關鍵字

reactive RF magnetron sputtering ； optical density change ； nickel oxide ； electrochromic material ； electrochemical behavior ； reduction peak ； oxidation peak

參考文獻

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