電漿濺鍍電致色變氧化鎳薄膜特性研究與節能評估

The Characterization of Electrochromic Nickel Oxide Film Prepared by RF Sputtering and The Evaluation of Energy Saving

謝育忠(Yu-Chung Hsieh)

指導教授 ： 鍾財王

中原大學/工學院/化學工程研究所/碩士(2002年)

https://doi.org/10.6840/cycu200200132

摘要

本研究利用反應性電漿離子濺鍍(Sputtering)方式製備電致色變氧化鎳薄膜，利用不同的製程參數，探討製備之氧化鎳薄膜電致色變特性與耐久使用性能，而其電化學性質量測時所使用之電解質溶液為0.1 M LiClO4。在本研究的製程與操作參數下，實驗結果顯示當電漿反應器通入氬氣/氧氣流量為40:10 sccm時，有較佳的穿透調節率變化量( 在可見光區接近0.45)，氧化鎳薄膜厚度越厚，則光學穿透調節率亦越大，而過高的外加電位會對電致色變薄膜結構造成破壞，使穿透調節率明顯下降，且充入的陽離子電荷量會隨著鍍膜功率增加或薄膜堆積密度增加而減少。由耐久測試得知以反應性真空濺鍍方式製備的氧化鎳電致色變薄膜有數千次以上的循環使用壽命，具有優異的實用性。
本實驗也藉由內政部公佈之『建築技術規則』內的建築外殼耗能量(ENVLOAD)指標，來加以評估變色節能材料應用於建築體上之實際節約能源效果。結果發現電致色變玻璃有效降低變色玻璃窗材之穿透率，的確比複層玻璃與空氣夾層玻璃能減少能源的負載量。

關鍵字

電漿濺鍍 ； ENVLOAD ； 節能 ； 電致色變 ； 氧化鎳薄膜

並列摘要

In this study, the electrochromic nickel oxide thin film with high coloration efficiency and durability was prepared by reactive vacuum rf sputtering system with different preparing conditions. The 0.1 M LiClO4 solution was used as an electrolyte in the measurement of electrochemistry. As the results, the nickel oxide film have better optical density change when the gas flow ratio Ar:O2 was 40:10 sccm entering the plasma reactor. As the thickness of film increased, the optical density change was increased. The film was defected by a higher applied voltage. It results in a decrease of optical modification. The higher packing density of the film led to the decrease of inject charge. Evaluate the nickel oxide thin film was evaluated over thousands of tests in this work.

The ENVLOAD index which was advertised by Interior Department of Government R.O.C. to evaluate the energy saving of coloration glazing application on architecture was applied in this study. In the Results, the coloration glazing can reduce the energy load effectively when compared with the double layer glass and the air gap glass.

並列關鍵字

Electrochromic ； Nickel oxide thin film ； Sputtering ； Energy saving ； ENVLOAD

參考文獻

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