以水熱法製備三氧化鎢奈米結構於電致變色元件之應用研究

Investigation of Electrochromic Properties of Tungsten Trioxide Nano-structure Preparation by Hydrothermal Process

劉權津(Cyuain-Jin Liu)

指導教授 ： 劉文仁

義守大學/理工學院/材料科學與工程學系/碩士(2015年)

https://doi.org/10.6343/ISU.2015.00248

摘要

本研究目的主要是利用水熱法製備奈米結構之三氧化鎢膜層，作為電致變色元件之變色層，並探討其微觀型態與元件變色性質。膜層前驅物之使用藥品為鎢酸鈉、鹽酸、草酸及氯化鈉之混合溶液，只透過這四種藥品之濃度參數、PH值、溫度及時間進行調配，利用水熱製程於FTO基板上，成長六方晶結構之三氧化鎢變色層膜層。同時，在進行水熱製程前，在FTO基板上預鍍上一層種晶層，並討論其對三氧化鎢成長影響。
藉由無種晶層及有種晶層之參數實驗發現最佳化之參數：鎢酸鈉濃度為0.1M、PH值為2.2、包覆劑濃度為0.005 mol、成長溫度為170℃、成長時間為4小時。至於元件之電致變色性質，在包覆劑濃度為 0.005 mol 時擁有較佳之比表面積，使得具備較多的反應面積與電解液中之鋰離子進行反應。

關鍵字

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並列摘要

The purpose of this study is to fabricate the nano-structures tungsten trioxide ( WO3 ) films by hydrothermal process and investigate the microstructure morphologies and electrochromic properties. The mixtures of sodium tungstate ( Na2WO4 ), hydrochloric acid ( HCl ), oxalic acid ( H2C2O4 ) and sodium chloride ( NaCl, capping agents ) were adopted to be the precursors of WO3 films for the hydrothermal process. The hexagonal structure WO3 films were grown on FTO substrate by varying the concentrations of mixtures, growth temperatures and growth times. At the same time, seed layer is adopted to be formed on FTO substrate before performing hydrothermal process and investigate the effect of seed layer on the following growth of WO3 films.
By a series of experiments, it was found the optimal parameters were the Na2WO4 concentration of 0.1M, the PH of 2.2, the capping agents of 0.005mol, the growth temperature of 170oC and the growth time of 4 hr. The capping agents of 0.005mol samples possessed better electrochromic properties is due to having larger specific surface which resulted in more easily react with Li+ ion in the electrolyte.

並列關鍵字

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參考文獻

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