透過您的圖書館登入
IP:3.19.30.232
  • 學位論文

半導體封裝製程之銀膠厚度與晶片傾斜度檢測

Measurements of Bond-line Thickness and Die Tilt in The Die Attach for Semiconductor Packaging Process

指導教授 : 章明

摘要


摘要 由於半導體製程與封裝技術的進步,相對的線上檢測技術需求也日與俱增,其中以黏晶製程與覆晶封裝檢測技術逐漸成為主流。覆晶有別於以往透過打線的互連模式,採用焊料或銀膠進行連結;由於銀膠充填時厚度參數會影響晶片封裝時的可靠度,因此本研究主要目的為建立一套銀膠厚度與晶片傾斜度之檢測系統。 本研究以線雷射掃描技術與空間對映函式法,採用傳統CCD攝影機進行快速、高解析度數據擷取,據以執行半導體封裝之銀膠厚度與晶片傾斜度等參數之量測。實驗時所使用之覆晶封裝樣品的晶片尺寸為15mm×15mm,從基板至晶片頂端之高度約為800~900μm,其中晶片厚度已知為800μm,結合基板與晶片的銀膠厚度大約為50~100μm,實驗結果顯示目前的系統量測解析度為3.47μm。 雖然本研究係以黏晶與覆晶封裝之銀膠檢測為目的,並以多功能、線上檢測以及低成本檢測設備研製為主要目標,但對於其他類似之半導體元件線上檢測需求而言,本系統亦能提供相同的檢測功能。

並列摘要


ABSTRACT Due to the progress of the semiconductor industry and packaging technology, the demand of the on-line inspection system is also expanding. The mainstream technology in inspections focuses around die attach and Flip-Chip packaging. Using soldering or conductive adhesive, the manufacturing process of Flip-Chip deviates from standard wire conjoint module. The reliability of the chip is also affected due to the bond-line thickness. Thus, this paper focuses upon building the measurement system of bond-line thickness and die tilt. Using traditional CCD to scan the object at high speeds and resolution by way of laser line scanning technology and coordinate mapping, the bond-line thickness and die tilt can be examined. Here the sample size is 15mm×15mm and the height is approximate 800~900μm from the substrate to die top interface. The known thickness of the dies is 800μm, with the bond-line thickness approximating 50~100μm. Examination results currently show the system resolution is 3.47μm. This study targets the bond-line thickness of the die attach and Flip-Chip packaging, focusing upon online measurement systems and cost-efficient equipment; yet is also able to provide test results on other measurements such as online inspection of semiconductor components.

參考文獻


[7] 李元裕,“投射疊紋掃描量測技術研究,” 中原大學機械工程學系碩士論文,2001年。
[18] 林高輝,“映射函數三維空間影像量測技術研究,” 中原大學機械工程學系博士論文,2002年。
[4] H. Takasaki, “Moiré Topography,” Applied Optics, Vol.9, No.6, pp.1467~1472,1970.
[5] F. P. Chiang, “Moiré Method of Strain Analysis,” Experimental Mechanics, pp.290~308, 1979.
[6] M. Chang and K. H. Lin, “Non-contact Probe for profilometric measurement of small-form parts,” Optical Engineering, Vol.40 No. 10, October 2001.

被引用紀錄


沈峻奭(2009)。植基於立體視覺之IC腳位尺寸量測〔碩士論文,國立臺北科技大學〕。華藝線上圖書館。https://doi.org/10.6841/NTUT.2009.00049

延伸閱讀