本研究提出一種新穎的物體外型輪廓量測方法,此法以傳統的投射疊紋法(projection moiré)結合線CCD掃描擷取影像的技術,獲得以等高線型態展示的條紋圖,配合多線CCD相位分析的技術,即可得知物體的外型輪廓資料。本研究亦針對量測系統提出一完整的校正方式,可有效的提升量測精度,經對一高度0.5mm的標準試件進行量測比對,實驗結果顯示其量測精度可達微米級以上。量測時所採用的影像解析度皆為640*480像素,當量測範圍為6.4*4.8mm時,其橫向解析度為10mm,縱向解析度可達0.2μm以上。整合本研究的成果,此技術將可提供微機電與半導體元件之製程線上外型輪廓檢測使用。
A novel and efficient moiré topography technique with high accuracy is presented. In this technique , a straight-line grating is projected on a translational object and the image of the grating is grabbed and integrated with a line CCD. This transfers the projected straight-line grating to a surface contour of the specimen. The contour map was quantitatively analyzed using phase measuring technique via a multi-line CCD. A process for the calibration of measurement system is proposed. Experimental results show that the measurement resolution can reach to the order of sub-micrometer. This offers a possibility for this technique to be applied to automated full-field profile measurement of the components used in MEMS and the IC industry.