苯胺亞硼酸修飾電極表面探討

張育銘

指導教授 ： 王忠茂

國立臺灣師範大學/理學院/化學系/碩士(2011年)

摘要

有鑒於pyrroloquinoline quinone（簡稱PQQ）在indium tin oxide（ITO）導電玻璃電極上被還原時，可與苯胺亞硼酸（Aminophenylboronic acid，簡稱APBA）進行偶合反應，並形成多層吸附，本論文進一步以電化學模組掃瞄式穿隧顯微技術（ESTM）在高定向熱解石墨（highly oriented pyrolytic graphite，簡稱HOPG）表面探討此一反應。實驗結果顯示：還原態PQQ會與APBA進行化學反應，鍵結於APBA修飾後的HOPG電極表面，之後，再物理吸附於電極上方。除了進行這些表面分析之外，我們也對APBA的其他應用潛力進行探討，發現APBA分子在原子力顯微鏡探針的電場施予下，可在電極表面上進行局部氧化聚合反應，可藉以製備奈米級圖像，因此具奈米印刷技術應用潛力。

關鍵字

亞硼酸 ； 掃描穿隧顯微鏡 ； 原子力顯微鏡

並列摘要

Aminophenylboronic acid (denoted APBA) can form coupling adducts with pyrroloquinoline quinone (denoted PQQ) on indium tin oxide (ITO) conductive glass as PQQ is reduced. In view of this, we continue to investigate this coupling reaction on highly oriented pyrolytic graphite (HOPG). Analysis based on the electrochemical mode scanning tunneling microscopic (ESTM) techniques reveals that PQQ can be chemically adsorbed on the APBA-modified HOPG electrodes as being reduced, and moreover, it can induce more PQQ to be adsorbed on the electrode physically. We also investigate the application potential of APBA, finding that APBA can undergo oxidative polymerization on ITO under the atomic force microscope-induced field. Because of this, APBA can be applied to microlithography and protein analysis as the molecular adhesive.

並列關鍵字

Aminophenylboronic acid ； Scanning tunneling microscopy ； Atomic force microscopy

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