硫酸對氧化石墨烯結構的影響

The Effect of Sulfuric Acid on Graphene Oxide

柴世濂

指導教授 ： 洪偉修

國立臺灣師範大學/理學院/化學系/碩士(2012年)

摘要

本研究分為(一)不同的硫酸濃度對GO 進行反應與(二)稀硫酸濃
度0.6M 對GO 進行不同的反應時間。
利用粉末X 光繞射儀、拉曼散射儀、X 光光電子能譜儀和四點
探針等儀器鑑定，對其材料進行分析。結構上，根據拉曼散射的D band
和G band 之比值可以得知材料的石墨化程度。隨著硫酸濃度增加至
18M，ID/IG 比值會從2.17 下降至1.46，表示脫水還原形成石墨烯。
然而，在稀硫酸0.6M 反應1.5 小時，GO 結構會進行開環，ID/IG 比值
從2.17 上升至2.89，表面缺陷增加；24 小時則會進行部份脫水還原，
ID/IG 比值從2.17 下降至1.71。電性上，隨著硫酸濃度的提升，導電
率從1.67×10-3S/m 提升至1.40×102S/m，由於高濃度的硫酸對GO 進
行脫水反應，使原本GO 表面的含氧官能基部分脫去，導電性因此變
高；然而0.6M 稀硫酸對GO 反應時間的增加，導電率從1.67×10-3S/m
提升至5.73×10-2S/m。
此研究是硫酸對GO 的時間和濃度影響，因此結果可提供以環
保的方式製備石墨烯以及GO 的結構修飾，作為重要的參考價值。

關鍵字

氧化石墨烯 ； 石墨烯 ； 硫酸 ； 還原

並列摘要

This thesis consists of two parts which are related to the treatment of
graphene oxides (GO) with H2SO4. The first part focuses on the reaction of GO
in solution of H2SO4 with various concentrations. The second part reports the
study for the reaction of GO in 0.6M H2SO4 for different reaction time.
The GO and GO-related materials were characterized with powder X-ray
diffraction, Raman spectrometry, X-ray photoelectron spectroscopy and four
probes measurement. According to Raman spectrometry, the intensity ratio of
D- and G-band (ID/IG) provides the degree of graphitization of GO after
treatment in solution of H2SO4. GO was treated in a solution of 18 M H2SO4
for 1.5 hr and the value of ID/IG decreased from 2.17 to 1.46 because the
hydroxyl groups were removed by the reaction of dehydration. The ratio of
ID/IG decreases with the increase the concentration of H2SO4. GO mainly
undergoes the ring-opening reactions of epoxyl groups in 0.6M H2SO4 at the
initial period and the value of ID/IG is 2.89 for the GO after a reaction time of
1.5 hr. The prolonged reaction decreases the value of ID/IG to 1.71, due to the
reduction of defects. The electrical measurements also indicates that the
conductivity of GO increases from 1.67×10-3 S/m to 1.40×102 S/m after the
reaction with 18 M H2SO4 for 1.5 hr, consistent with measurements of Raman
spectroscopy. However, the conductivity of GO increases only up to 5.73×
10-2S/m after treatment in 0.6 M H2SO4 for 24 hr.
This thesis provides a environmental method of synthesizing graphene
and modification of GO’s framework. It is an important viewpoint for
producing graphene .

並列關鍵字

graphene oxide ； rGO ； sulfuric acid ； reduction

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