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  • 學位論文

奈米銀粒子雷射直寫精密熔接技術

Precision Laser Direct-Write Sintering Technology for Silver Nanoparticles.

指導教授 : 鄭旭志
共同指導教授 : 劉建宏(Chien-Hung Liu)
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摘要


由於薄膜顯示技術的大尺寸化,為了僅在部分面積上產生所需的電路,而將整片面板鍍上光罩,產生電路導線,是非常浪費成本的。於是本文使用雷射直寫的技術於玻璃基板上佈植銀導線之方法及實驗結果。本系統的雷射直寫技術(laser direct-write technique)是採用市售藍光光學讀取頭(blue-ray optical pickup)做為系統光源,其波長為405nm、數值孔徑(N.A.)為0.85之聚焦透鏡,故可將光點縮小至紅光光學讀取頭的19%。實驗的試片是先調配奈米銀溶液,將其溶液均勻塗佈至玻璃基板上後,使用光學讀取頭內部的光檢測器積體電路(photo diode integrated circuit,PDIC)接收自玻璃基板反射回來之聚焦誤差訊號(focus error signal,FES),用於判別雷射光點是否處於正焦處,再搭配音圈馬達(voice coil motor,VCM)並以Labview程式控制其上下位移,即可達到自動化鎖焦的功能,這樣可縮短系統製程時間及降低人為調校誤差。圖案基板則載於奈米平台上,藉由平台之移動和程式控制光學讀取頭的光源能量,達成直寫銀導線之成效,依照此方法線寬可達400 nm。

並列摘要


The film display technology is growing mature, so the size of films is growing larger as well. It is very wasteful and resources unwise to generate circuit wire only in part of the area by plating the whole panel with mask. Therefore, we improve that disadvantage by adopting laser direct-write technique on the glass substrate to implant silver wire. The laser direct-write technique uses the blue-ray optical pickup as the resource of light, and it is a focusing lens with 405nm wavelength and 0.85 N.A. (numerical aperture). The characteristics above make it able to shrink the resource of light to 19% of the red-ray optical pickup. The sample specimen used in the experiment needed to coat the nano-silver solution on the glass substrate first, and then took advantage of the PDIC (photo diode integrated circuit) inside of the optical pickup to receive the FES (focus error signal) reflected by the glass substrate. It is used to distinguish whether the laser spot is on the positive focus and it can further achieve the atomization of the lock focus with VCM (voice coil motor) and with Labview program which controls the up and down displacement. It can shorten the manufacture process and decrease errors by human tuning. The patterned substrate is contained on the nano-platform and it controls the light energy of the optical pickup by the platform mobile and programs to get the effect of direct-write silver solution. The line width can up to 400 nm according to our test result.

參考文獻


[17]何依萍,2007,「利用雷射直寫佈植金屬導線之研究」,國立清華大學光電工程研究所碩士論文,指導教授楊士禮。
[21] 邱建偉,2006,「高斯光學對於光同調斷層攝影術之影響」,私立中原大學應用物理研究所碩士論文,指導教授許怡仁。
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[2] Dr. Sara Skrabalak., Younan Xia.,2007, “Rapid Synthesis of Silver Nanowires,” Nanotechnology, Chemistry, Bradley University.
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被引用紀錄


徐銓駿(2016)。奈米粒子對高分子分散型液晶光電特性之影響〔碩士論文,中原大學〕。華藝線上圖書館。https://doi.org/10.6840/cycu201600946

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